Multilevel Hierarchical Structure Formed in the Film (Ti)/Substrate (SiC-Ceramics) System under Irradiation by an Intense Pulsed Electron Beam
| Parent link: | AIP Conference Proceedings Vol. 2051 : Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures 2018 (AMHS’18).— 2018.— [020110, 4 p.] |
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| Coauteurs: | , , , |
| Andere auteurs: | , , , , , , |
| Samenvatting: | Title screen The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 [mu]m was formed by vacuum electric-arc plasmaassisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm{2} , pulse duration 200 [mu]s, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly. Режим доступа: по договору с организацией-держателем ресурса |
| Gepubliceerd in: |
2018
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| Onderwerpen: | |
| Online toegang: | https://doi.org/10.1063/1.5083353 |
| Formaat: | Elektronisch Hoofdstuk |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659176 |
| Samenvatting: | Title screen The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 [mu]m was formed by vacuum electric-arc plasmaassisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm{2} , pulse duration 200 [mu]s, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly. Режим доступа: по договору с организацией-держателем ресурса |
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| DOI: | 10.1063/1.5083353 |