Thermal stability and oxidation resistance of ZrSiN nanocomposite and ZrN/SiNx multilayered coatings: A comparative study; Surface and Coatings Technology; Vol. 332
| Parent link: | Surface and Coatings Technology Vol. 332.— 2017.— [P. 428-439] |
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| Співавтор: | |
| Інші автори: | , , , , |
| Резюме: | Title screen In the present work we comparatively study the thermal stability and oxidation resistance of ~ 300 nm thick Zr-Si-N coatings with either 2D or 3D interface geometry: 1) Zr-Si-N nanocomposites and 2) ZrN/SiNx nanoscale multilayers. Both types of films were prepared by reactive magnetron sputter-deposition on Si wafers under Ar + N2 plasma discharges. Zr-Si-N films were deposited by co-sputtering from Zr and Si targets at substrate temperature Tdep of 600 °C, with Si content ranging from 0 to 22.1 at.%, while ZrN/SiNx multilayers with ZrN (resp. SiNx) layer thickness varying from 2 to 40 nm (resp. 0.4 to 20 nm) were synthesized by sequential sputtering from elemental Zr and Si3N4 targets at Tdep = 300 °C. According to transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis the microstructure of Zr-Si-N films changes from dual-phase nanocomposite structure, consisting of ZrN nanograins (4–7 nm) surrounded by an amorphous tissue, towards X-ray amorphous with increasing Si content. The multilayered films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. The structural evolution has been investigated by XRD after vacuum annealing at 1000 °C, while the oxidation resistance under air was studied using in situ XRD in the temperature range from 400 to 950 °C, as well as by scanning electron microscopy (SEM) and wavelength dispersive X-ray spectrometry (WDS) after air annealing procedure. While the reference ZrN film starts to oxidize at Tox. = 550 °C, a much higher oxidation resistance is found for multilayered films, till Tox. = 860–950 °C for ZrN/SiNx coatings with the elementary layer thickness ratio of 5 nm/10 nm, 3 nm/5 nm and 2 nm/5 nm. ZrSiN nanocomposites exhibit an improved oxidation resistance with increasing Si content compared to binary ZrN compound, but their stability is worst comparatively to the multilayers case. Режим доступа: по договору с организацией-держателем ресурса |
| Мова: | Англійська |
| Опубліковано: |
2017
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| Предмети: | |
| Онлайн доступ: | https://doi.org/10.1016/j.surfcoat.2017.08.076 |
| Формат: | Електронний ресурс Частина з книги |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=659099 |
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| 200 | 1 | |a Thermal stability and oxidation resistance of ZrSiN nanocomposite and ZrN/SiNx multilayered coatings: A comparative study |f I. A. Saladukhin [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 56 tit.] | ||
| 330 | |a In the present work we comparatively study the thermal stability and oxidation resistance of ~ 300 nm thick Zr-Si-N coatings with either 2D or 3D interface geometry: 1) Zr-Si-N nanocomposites and 2) ZrN/SiNx nanoscale multilayers. Both types of films were prepared by reactive magnetron sputter-deposition on Si wafers under Ar + N2 plasma discharges. Zr-Si-N films were deposited by co-sputtering from Zr and Si targets at substrate temperature Tdep of 600 °C, with Si content ranging from 0 to 22.1 at.%, while ZrN/SiNx multilayers with ZrN (resp. SiNx) layer thickness varying from 2 to 40 nm (resp. 0.4 to 20 nm) were synthesized by sequential sputtering from elemental Zr and Si3N4 targets at Tdep = 300 °C. According to transmission electron microscopy (TEM) and X-ray diffraction (XRD) analysis the microstructure of Zr-Si-N films changes from dual-phase nanocomposite structure, consisting of ZrN nanograins (4–7 nm) surrounded by an amorphous tissue, towards X-ray amorphous with increasing Si content. The multilayered films consist of nanocrystalline (002)-oriented ZrN and amorphous SiNx layers. The structural evolution has been investigated by XRD after vacuum annealing at 1000 °C, while the oxidation resistance under air was studied using in situ XRD in the temperature range from 400 to 950 °C, as well as by scanning electron microscopy (SEM) and wavelength dispersive X-ray spectrometry (WDS) after air annealing procedure. While the reference ZrN film starts to oxidize at Tox. = 550 °C, a much higher oxidation resistance is found for multilayered films, till Tox. = 860–950 °C for ZrN/SiNx coatings with the elementary layer thickness ratio of 5 nm/10 nm, 3 nm/5 nm and 2 nm/5 nm. ZrSiN nanocomposites exhibit an improved oxidation resistance with increasing Si content compared to binary ZrN compound, but their stability is worst comparatively to the multilayers case. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | 1 | |t Surface and Coatings Technology | |
| 463 | 1 | |t Vol. 332 |v [P. 428-439] |d 2017 | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a multilayer | |
| 610 | 1 | |a nanocomposite | |
| 610 | 1 | |a oxidation | |
| 610 | 1 | |a reactive magnetron sputter-deposition | |
| 610 | 1 | |a hard coatingsZr-Si-N | |
| 610 | 1 | |a нанокомпозиты | |
| 610 | 1 | |a оксидирование | |
| 610 | 1 | |a магнетронное напыление | |
| 610 | 1 | |a твердые покрытия | |
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| 701 | 1 | |a Abadias |b G. |g Gregor | |
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| 701 | 1 | |a Michel |b A. |g Anny | |
| 701 | 1 | |a Janse Van Vuuren |b А. |g Arno | |
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