Angular thickness distribution and target utilization for hot Ni target magnetron sputtering; Vacuum; Vol. 160
| Parent link: | Vacuum Vol. 160.— 2018.— [P. 418-420] |
|---|---|
| 1. Verfasser: | |
| Körperschaft: | |
| Weitere Verfasser: | |
| Zusammenfassung: | Title screen This paper reports on the effect of the type of Ni target (hot or cooled) on the angular thickness distribution, deposition rate and target utilization (K) for magnetron sputtering. Here it is shown that a change of magnetic field distribution does not influence on the mass of the deposited material. The Ni films will have a more uniform thickness, when films are obtained by hot target sputtering. The target utilization is higher for magnetron with hot target. This suggests a new approach to increase of K for the sputtering of magnetic targets. Режим доступа: по договору с организацией-держателем ресурса |
| Sprache: | Englisch |
| Veröffentlicht: |
2018
|
| Schlagworte: | |
| Online-Zugang: | https://doi.org/10.1016/j.vacuum.2018.12.001 |
| Format: | Elektronisch Buchkapitel |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=658897 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 658897 | ||
| 005 | 20260210071611.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\27121 | ||
| 090 | |a 658897 | ||
| 100 | |a 20181213d2018 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Angular thickness distribution and target utilization for hot Ni target magnetron sputtering |f D. V. Sidelev, V. P. Krivobokov | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 25 tit.] | ||
| 330 | |a This paper reports on the effect of the type of Ni target (hot or cooled) on the angular thickness distribution, deposition rate and target utilization (K) for magnetron sputtering. Here it is shown that a change of magnetic field distribution does not influence on the mass of the deposited material. The Ni films will have a more uniform thickness, when films are obtained by hot target sputtering. The target utilization is higher for magnetron with hot target. This suggests a new approach to increase of K for the sputtering of magnetic targets. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | 1 | |t Vacuum | |
| 463 | 1 | |t Vol. 160 |v [P. 418-420] |d 2018 | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a магнетронные распылительные системы | |
| 610 | 1 | |a мишень | |
| 610 | 1 | |a угловое распределение | |
| 610 | 1 | |a толщина | |
| 700 | 1 | |a Sidelev |b D. V. |c physicist |c Associate Professor of Tomsk Polytechnic University, Candidate of Technical Sciences |f 1991- |g Dmitry Vladimirovich |y Tomsk |3 (RuTPU)RU\TPU\pers\34524 |9 17905 | |
| 701 | 1 | |a Krivobokov |b V. P. |c Russian physicist |c professor of Tomsk Polytechnic University (TPU), Doctor of Physical and Mathematical Sciences (DSc) |f 1948- |g Valery Pavlovich |3 (RuTPU)RU\TPU\pers\30416 |9 14757 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа ядерных технологий |b Научно-образовательный центр Б. П. Вейнберга |3 (RuTPU)RU\TPU\col\23561 |
| 801 | 2 | |a RU |b 63413507 |c 20181213 |g RCR | |
| 856 | 4 | |u https://doi.org/10.1016/j.vacuum.2018.12.001 | |
| 942 | |c CF | ||