Surface erosion of hot Cr target and deposition rates of Cr coatings in high power pulsed magnetron sputtering; Surface and Coatings Technology; Vol. 354
| Parent link: | Surface and Coatings Technology Vol. 354.— 2018.— [P. 161-168] |
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| Institution som forfatter: | |
| Andre forfattere: | , , , , |
| Summary: | Title screen High power pulsed magnetron sputtering (HPPMS) of a hot chromium target by using a combined power source is the aim the present research. The combination of HPPMS technique and hot target can be effective way to produce Cr coatings. The investigations were performed by using a power supply with pulse frequency of 500?Hz, duty cycle of 4% in the range of power density averaged over pulse period from 15 to 65?W/cm2. The specific feature of the investigation is that sputtering and sublimation of the target occur simultaneously. The experimental results and the calculations revealed the important role of sublimated Cr atoms concentration near the target in increasing the pulsed and average discharge current and in setting up the self-sputtering mode. The erosion yield of the hot Cr target is determined, and in the investigated power range, it increases from 1.5 to 30 atoms per ion due to sublimation. As a result, the coating deposition rate by HPPMS from hot solid target can be increased 10–30 times in comparison to cooled target sputtering. AM_Agreement |
| Sprog: | engelsk |
| Udgivet: |
2018
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| Fag: | |
| Online adgang: | https://doi.org/10.1016/j.surfcoat.2018.09.030 |
| Format: | Electronisk Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=658834 |
MARC
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| 200 | 1 | |a Surface erosion of hot Cr target and deposition rates of Cr coatings in high power pulsed magnetron sputtering |f G. A. Bleykher (Bleicher) [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 36 tit.] | ||
| 330 | |a High power pulsed magnetron sputtering (HPPMS) of a hot chromium target by using a combined power source is the aim the present research. The combination of HPPMS technique and hot target can be effective way to produce Cr coatings. The investigations were performed by using a power supply with pulse frequency of 500?Hz, duty cycle of 4% in the range of power density averaged over pulse period from 15 to 65?W/cm2. The specific feature of the investigation is that sputtering and sublimation of the target occur simultaneously. The experimental results and the calculations revealed the important role of sublimated Cr atoms concentration near the target in increasing the pulsed and average discharge current and in setting up the self-sputtering mode. The erosion yield of the hot Cr target is determined, and in the investigated power range, it increases from 1.5 to 30 atoms per ion due to sublimation. As a result, the coating deposition rate by HPPMS from hot solid target can be increased 10–30 times in comparison to cooled target sputtering. | ||
| 371 | 0 | |a AM_Agreement | |
| 461 | 1 | |t Surface and Coatings Technology | |
| 463 | 1 | |t Vol. 354 |v [P. 161-168] |d 2018 | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a магнетронное напыление | |
| 610 | 1 | |a сублимация | |
| 610 | 1 | |a испарения | |
| 701 | 1 | |a Bleykher (Bleicher) |b G. A. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of Physical and Mathematical Sciences |f 1961- |g Galina Alekseevna |3 (RuTPU)RU\TPU\pers\31496 |9 15657 | |
| 701 | 1 | |a Sidelev |b D. V. |c physicist |c Associate Professor of Tomsk Polytechnic University, Candidate of Technical Sciences |f 1991- |g Dmitry Vladimirovich |y Tomsk |3 (RuTPU)RU\TPU\pers\34524 |9 17905 | |
| 701 | 1 | |a Grudinin |b V. A. |c physicist |c engineer of Tomsk Polytechnic University |f 1995- |g Vladislav Alekseevich |3 (RuTPU)RU\TPU\pers\42519 |9 21548 | |
| 701 | 1 | |a Krivobokov |b V. P. |c Russian physicist |c professor of Tomsk Polytechnic University (TPU), Doctor of Physical and Mathematical Sciences (DSc) |f 1948- |g Valery Pavlovich |3 (RuTPU)RU\TPU\pers\30416 |9 14757 | |
| 701 | 1 | |a Bestetti |b M. |c physicist |c Researcher of Tomsk Polytechnic University |f 1965- |g Massimiliano |3 (RuTPU)RU\TPU\pers\37134 |9 20127 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа ядерных технологий |b Научно-образовательный центр Б. П. Вейнберга |3 (RuTPU)RU\TPU\col\23561 |9 28358 |
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| 856 | 4 | |u https://doi.org/10.1016/j.surfcoat.2018.09.030 | |
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