Influence of a Pulsed Electron Beam on the Sowing Quality of Wheat

Influence of a Pulsed Electron Beam on the Sowing Quality of Wheat

Dettagli Bibliografici
Parent link:Key Engineering Materials: Scientific Journal
Vol. 769 : High Technology: Research and Applications (HTRA 2017).— 2018.— [172-180]
Enti autori: Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов, Национальный исследовательский Томский политехнический университет Инженерная школа новых производственных технологий Научно-производственная лаборатория "Импульсно-пучковых, электроразрядных и плазменных технологий"
Altri autori: Isemberlinova A. A. Asemgul Asentaevna, Egorov I. S. Ivan Sergeevich, Kurilova A. A. Anastasia, Nuzhnyh S. A. Svetlana, Remnev G. E. Gennady Efimovich
Riassunto:Title screen
Wheat grain has been irradiated by 200 keV and 305 keV of pulsed electron beams for changing of sowing parameters. Total microbial number, germination and germination energy were compared for both of electron kinetic energy settings for the same ranges of the energy input. The electron beam of 305 keV showed better disinfecting effect for energy input values of less than 4 J/g. That mode eliminates seed germination ability after irradiation of more than 2 J/g and can be used for grain storing. The mode of 200 keV beam keeps seed germination ability up to 5 J/g with the similar disinfecting effect after the irradiation energy input of more than 4 J/g. This mode can be used for pre-sowing seed treatment procedure.
Режим доступа: по договору с организацией-держателем ресурса
Lingua:inglese
Pubblicazione: 2018
Soggetti:
электронный ресурс
труды учёных ТПУ
Disinfection of Seeds
Germination
Germinative Energy
Ionizing Radiation
Pathogens
Pulsed Electron Beam
Radiation Stimulation
Total Microbe Number
дезинфекция
ионизирующие излучения
семена
патогены
импульсные пучки
электронные пучки
радиация
качество
Accesso online:https://doi.org/10.4028/www.scientific.net/KEM.769.172
Natura: Elettronico Capitolo di libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=658643
Descrizione
Riassunto:Title screen
Wheat grain has been irradiated by 200 keV and 305 keV of pulsed electron beams for changing of sowing parameters. Total microbial number, germination and germination energy were compared for both of electron kinetic energy settings for the same ranges of the energy input. The electron beam of 305 keV showed better disinfecting effect for energy input values of less than 4 J/g. That mode eliminates seed germination ability after irradiation of more than 2 J/g and can be used for grain storing. The mode of 200 keV beam keeps seed germination ability up to 5 J/g with the similar disinfecting effect after the irradiation energy input of more than 4 J/g. This mode can be used for pre-sowing seed treatment procedure.
Режим доступа: по договору с организацией-держателем ресурса
DOI:10.4028/www.scientific.net/KEM.769.172

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