The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering; Vacuum; Vol. 152

The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering; Vacuum; Vol. 152

গ্রন্থ-পঞ্জীর বিবরন
Parent link:Vacuum
Vol. 152.— 2018.— [P. 156-165]
সংস্থা লেখক: Национальный исследовательский Томский политехнический университет Инженерная школа ядерных технологий Научно-образовательный центр Б. П. Вейнберга
অন্যান্য লেখক: Bleykher (Bleicher) G. A. Galina Alekseevna, Yuryeva A. V. Alena Victorovna, Shabunin A. S. Artem Sergeevich, Krivobokov V. P. Valery Pavlovich, Sidelev D. V. Dmitry Vladimirovich
সংক্ষিপ্ত:Title screen
The main focus of the article is the study of function mechanisms of a magnetron sputtering system (MSS) with a heat-insulated metal target in a self-sputtering gasless mode. A distinctive feature of the studied case is that the target evaporation takes place along with its sputtering. The research has been carried out on a copper target sample in molybdenum crucible. It has been found that because of evaporation the MSS can function stably using metal vapors without sputtering gas. The pressure in the chamber is 0.01?Pa. The current-voltage characteristics and spatial distribution of the copper atoms concentration near the target have been determined at the power density from 14 to 72?W/cm2. The minimum power density necessary for a stable gasless self-sputtering mode is 19.4?W/cm2. Herewith the evaporated particles constitute approximately 87% of the total number of copper atoms near the target. It has been found that the erosion coefficients of metal targets at evaporation reach several tens of atoms per ion, which is an order of magnitude higher than the sputtering yield. Due to this, the coatings deposition under self-sputtering conditions takes place without reducing a deposition rate as compared to the case with sputtering gas.
Режим доступа: по договору с организацией-держателем ресурса
ভাষা:ইংরেজি
প্রকাশিত: 2018
বিষয়গুলি:
электронный ресурс
труды учёных ТПУ
magnetron sputtering systems
evaporation
self-sputtering
low-pressure magnetron sputtering
high purity coatings
coatings deposition
магнетронные распылительные системы
испарение
низкое давление
напыление
অনলাইন ব্যবহার করুন:https://doi.org/10.1016/j.vacuum.2018.03.020
বিন্যাস: বৈদ্যুতিক গ্রন্থের অধ্যায়
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=658617

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