Irradiation of sputtered Al-Si-N coatings by pulsed 200 keV C+ion beam

Irradiation of sputtered Al-Si-N coatings by pulsed 200 keV C+ion beam

Bibliographic Details
Parent link:Vacuum
Vol. 158.— 2018.— [P. 65-67]
Corporate Author: Национальный исследовательский Томский политехнический университет Исследовательская школа физики высокоэнергетических процессов
Other Authors: Remnev G. E. Gennady Efimovich, Tarbokov V. A. Vladislav Aleksandrovich, Pavlov S. K. Sergey Konstantinovich, Konusov F. V. Fedor Valerievich, Zenkin S. P. Sergey Petrovich, Musil Y. Yindrikh
Summary:Title screen
This paper reports on the effect of the irradiation of Al-Si-N coatings by an intense pulsed ion beam. The Al-Si-N coating was deposited on a steel substrate by a reactive magnetron sputtering. The Al-Si-N coating with a high silicon content (30?at.%) was irradiated by a high-intense pulsed C+ ion beam. It was shown that metastable growth defects (GDs) created in the Al-Si-N coating during deposition can be healed up by its post-deposition irradiation using several pulses (1 and 10) of C+ ions with energy Ei?=?200?keV, ion current density is?=?7 A/cm2, pulse duration tp?=?110 ns and radiation dose 2?MGy. The reduction in deposition-induced GD density results in an increased transmittance of the Al-Si-N coatings.
Режим доступа: по договору с организацией-держателем ресурса
Language:English
Published: 2018
Subjects:
электронный ресурс
труды учёных ТПУ
излучения
прозрачность
магнетронное распыление
Online Access:https://doi.org/10.1016/j.vacuum.2018.09.022
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=658330

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