Features of focusing of a high-intensity pulsed ion beam formed by a diode with a passive anode; Instruments and Experimental Techniques; Vol. 60, iss. 4
| Parent link: | Instruments and Experimental Techniques.— , 1956- Vol. 60, iss. 4.— 2017.— [P. 562–569] |
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| Autor Corporativo: | |
| Outros autores: | , , , , |
| Summary: | Title screen The results of investigating the focusing of a high-power ion beam, which is formed by a diode with a semicylindrical geometry and a passive anode, are presented. Two types of focusing diodes were investigated: with external magnetic insulation (one-pulse mode) and self-magnetic insulation of electrons (twopulse mode). Measurements of the energy-density distribution of the ion beam and the ion-current density were performed. It was found that when the diode operates in the two-pulse mode, the region of the maximum ion-beam energy density in the focal plane is displaced relative to the region of the maximum ion-current density by 5–10 mm. It is shown that the effect of a displacement of the focal spot with the maximum energy density is determined by the presence of a large number of accelerated neutral atoms in the ion beam. These atoms are produced as a result of the ion charge-exchange process in the anode–cathode gap of the ion diode during its operation in the two-pulse mode. Режим доступа: по договору с организацией-держателем ресурса |
| Idioma: | inglés |
| Publicado: |
2017
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| Subjects: | |
| Acceso en liña: | https://doi.org/10.1134/S0020441217030277 |
| Formato: | MixedMaterials Electrónico Capítulo de libro |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=657795 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 657795 | ||
| 005 | 20250123142021.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\24556 | ||
| 090 | |a 657795 | ||
| 100 | |a 20180321d2017 k||y0engy50 ba | ||
| 101 | 1 | |a eng | |
| 102 | |a US | ||
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Features of focusing of a high-intensity pulsed ion beam formed by a diode with a passive anode |f X. P. Zhu [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: p. 569 (22 tit.)] | ||
| 330 | |a The results of investigating the focusing of a high-power ion beam, which is formed by a diode with a semicylindrical geometry and a passive anode, are presented. Two types of focusing diodes were investigated: with external magnetic insulation (one-pulse mode) and self-magnetic insulation of electrons (twopulse mode). Measurements of the energy-density distribution of the ion beam and the ion-current density were performed. It was found that when the diode operates in the two-pulse mode, the region of the maximum ion-beam energy density in the focal plane is displaced relative to the region of the maximum ion-current density by 5–10 mm. It is shown that the effect of a displacement of the focal spot with the maximum energy density is determined by the presence of a large number of accelerated neutral atoms in the ion beam. These atoms are produced as a result of the ion charge-exchange process in the anode–cathode gap of the ion diode during its operation in the two-pulse mode. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Instruments and Experimental Techniques |d 1956- | ||
| 463 | |t Vol. 60, iss. 4 |v [P. 562–569] |d 2017 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a ионные пучки | |
| 610 | 1 | |a электроды | |
| 610 | 1 | |a диоды | |
| 701 | 1 | |a Zhu |b X. P. | |
| 701 | 1 | |a Ding |b L. | |
| 701 | 1 | |a Zhang |b Q. | |
| 701 | 1 | |a Pushkarev |b A. I. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences, Senior researcher |f 1954- |g Aleksandr Ivanovich |3 (RuTPU)RU\TPU\pers\32701 |9 16587 | |
| 701 | 1 | |a Lei |b M. K. | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа новых производственных технологий |b Отделение материаловедения |3 (RuTPU)RU\TPU\col\23508 |
| 801 | 2 | |a RU |b 63413507 |c 20180321 |g RCR | |
| 856 | 4 | |u https://doi.org/10.1134/S0020441217030277 | |
| 942 | |c CF | ||