Natural Oxidation of Ultra-Thin Copper Films; Russian Physics Journal; Vol. 60, iss. 9
| Parent link: | Russian Physics Journal Vol. 60, iss. 9.— 2018.— [P. 1559-1564] |
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| 共著者: | , |
| その他の著者: | , , , , , |
| 要約: | Title screen The paper examines the oxidation of polycrystalline Cu films under the impact of ambient atmosphere in the course of extended time (from 20 to 90 days). It shows that in the case of 10 nm thick Cu films deposited onto the glass substrate by method of magnetron sputtering, one eventually observes the increase in transparency, surface resistance and surface roughness, as well as the decrease in reflection in the area of near infrared region. The most dramatic changes occur in films deposited in the pulse mode of sputtering with frequency of 3 kHz compared to films deposited in the direct current mode. Formation of sublayer ZnO:Al and 20 nm thick upper passivating layer ZnO:Al allows effectively preventing the oxidation of thin copper films under the impact of ambient atmosphere. Режим доступа: по договору с организацией-держателем ресурса |
| 言語: | 英語 |
| 出版事項: |
2018
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| 主題: | |
| オンライン･アクセス: | https://doi.org/10.1007/s11182-018-1251-7 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=657751 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 657751 | ||
| 005 | 20250122183954.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\24477 | ||
| 090 | |a 657751 | ||
| 100 | |a 20180314d2018 k||y0engy50 ba | ||
| 101 | 0 | |a eng | |
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Natural Oxidation of Ultra-Thin Copper Films |f V. A. Semenov [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 14 tit.] | ||
| 330 | |a The paper examines the oxidation of polycrystalline Cu films under the impact of ambient atmosphere in the course of extended time (from 20 to 90 days). It shows that in the case of 10 nm thick Cu films deposited onto the glass substrate by method of magnetron sputtering, one eventually observes the increase in transparency, surface resistance and surface roughness, as well as the decrease in reflection in the area of near infrared region. The most dramatic changes occur in films deposited in the pulse mode of sputtering with frequency of 3 kHz compared to films deposited in the direct current mode. Formation of sublayer ZnO:Al and 20 nm thick upper passivating layer ZnO:Al allows effectively preventing the oxidation of thin copper films under the impact of ambient atmosphere. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Russian Physics Journal | ||
| 463 | |t Vol. 60, iss. 9 |v [P. 1559-1564] |d 2018 | ||
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a микроволновые печи | |
| 610 | 1 | |a copper | |
| 610 | 1 | |a thin films | |
| 610 | 1 | |a oxidation | |
| 610 | 1 | |a microstructure | |
| 610 | 1 | |a микроструктура | |
| 610 | 1 | |a окисление | |
| 610 | 1 | |a тонкие пленки | |
| 610 | 1 | |a медь | |
| 701 | 1 | |a Semenov |b V. A. |g Vyacheslav Arkadjevich | |
| 701 | 1 | |a Oskirko |b V. O. |g Vladimir Olegovich | |
| 701 | 1 | |a Rabotkin |b S. V. |g Sergey Viktorovich | |
| 701 | 1 | |a Oskomov |b K. V. |g Konstantin Vladimirovich | |
| 701 | 1 | |a Soloviev |b A. A. |c specialist in the field of hydrogen energy |c Associate Professor of Tomsk Polytechnic University, Candidate of technical sciences |f 1977- |g Andrey Aleksandrovich |3 (RuTPU)RU\TPU\pers\30863 | |
| 701 | 1 | |a Stepanov |b S. A. |c specialist in the field of lightning engineering |c Engineer of Tomsk Polytechnic University |f 1986- |g Sergey Aleksandrovich |3 (RuTPU)RU\TPU\pers\33771 |9 17369 | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет |b Инженерная школа ядерных технологий |b Научно-образовательный центр Б. П. Вейнберга |3 (RuTPU)RU\TPU\col\23561 |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Инженерная школа новых производственных технологий (ИШНПТ) |b Отделение материаловедения (ОМ) |3 (RuTPU)RU\TPU\col\23508 |
| 801 | 2 | |a RU |b 63413507 |c 20180314 |g RCR | |
| 856 | 4 | 0 | |u https://doi.org/10.1007/s11182-018-1251-7 |
| 942 | |c CF | ||