Electrodischarged Ti-(B, C, Si)-coating

Podrobná bibliografie
Parent link:Journal of Physics: Conference Series
Vol. 857 : 13th International Conference on Films and Coatings (ICFC13).— 2017.— [012042, 4 p.]
Korporativní autor: Национальный исследовательский Томский политехнический университет Инженерная школа энергетики Отделение электроэнергетики и электротехники (ОЭЭ)
Další autoři: Sivkov A. A. Aleksandr Anatolyevich, Rakhmatullin I. A. Ilyas Aminovich, Gerasimov D. Yu. Dmitry Yurievich, Nikitin D. S. Dmitry Sergeevich
Shrnutí:Title screen
The possibility of using hyperhigh speed high current electrodischarged Ti-plasma, generated by coaxial magnetoplasma accelerator as a method for Ti-C, Ti-B and Ti-Si coatings is shown. It is estimated that the most ordered microstructure is formed for a sample obtained under W = 46.7 kJ and 2.0 g carbon load. The average level of nanohardness for this sample is 15.3 GPa.
Vydáno: 2017
Témata:
On-line přístup:https://doi.org/10.1088/1742-6596/857/1/012042
Médium: Elektronický zdroj Kapitola
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=657558
Popis
Shrnutí:Title screen
The possibility of using hyperhigh speed high current electrodischarged Ti-plasma, generated by coaxial magnetoplasma accelerator as a method for Ti-C, Ti-B and Ti-Si coatings is shown. It is estimated that the most ordered microstructure is formed for a sample obtained under W = 46.7 kJ and 2.0 g carbon load. The average level of nanohardness for this sample is 15.3 GPa.
DOI:10.1088/1742-6596/857/1/012042