Degradation of Nitride Coatings in Low-Pressure Gas Discharge Plasma; AIP Conference Proceedings; Vol. 1909 : Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures 2017 (AMHS’17)

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Parent link:AIP Conference Proceedings
Vol. 1909 : Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures 2017 (AMHS’17).— 2017.— [020074, 4 p.]
Údar corparáideach: Томский политехнический университет
Rannpháirtithe: Ivanov Yu. F. Yuriy Fedorovich, Shugurov V. Vladimir, Krysina O. Olga, Petrikova E. Elizaveta, Tolkachev O. S. Oleg Sergeevich
Achoimre:Title screen
The paper provides research data on the defect structure, mechanical characteristics, and tribological properties of commercially pure VT1-0 titanium exposed to surface modification on a COMPLEX laboratory electron-ion plasma setup which allows nitriding, coating deposition, and etching in low-pressure gas discharge plasma in a single vacuum cycle. It is shown that preliminary plasma nitriding forms a columnar Ti[2]N phase in VT1-0 titanium and that subsequent TiN deposition results in a thin nanocrystalline TiN layer. When the coating-substrate system is etched, the coating fails and the tribological properties of the material degrade greatly.
Режим доступа: по договору с организацией-держателем ресурса
Teanga:Béarla
Foilsithe / Cruthaithe: 2017
Ábhair:
Rochtain ar líne:https://doi.org/10.1063/1.5013755
Formáid: Leictreonach Caibidil leabhair
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=657118

MARC

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200 1 |a Degradation of Nitride Coatings in Low-Pressure Gas Discharge Plasma  |f Yu. F. Ivanov [et al.] 
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330 |a The paper provides research data on the defect structure, mechanical characteristics, and tribological properties of commercially pure VT1-0 titanium exposed to surface modification on a COMPLEX laboratory electron-ion plasma setup which allows nitriding, coating deposition, and etching in low-pressure gas discharge plasma in a single vacuum cycle. It is shown that preliminary plasma nitriding forms a columnar Ti[2]N phase in VT1-0 titanium and that subsequent TiN deposition results in a thin nanocrystalline TiN layer. When the coating-substrate system is etched, the coating fails and the tribological properties of the material degrade greatly. 
333 |a Режим доступа: по договору с организацией-держателем ресурса 
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463 0 |0 (RuTPU)RU\TPU\network\23152  |t Vol. 1909 : Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures 2017 (AMHS’17)  |o Proceedings of the International conference, 9–13 October 2017, Tomsk, Russia  |f National Research Tomsk Polytechnic University (TPU); eds. V. E. Panin, S. G. Psakhie, V. M. Fomin  |v [020074, 4 p.]  |d 2017 
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