Effect of Magnetron Deposition Conditions on the Structure, Phase Composition and Properties of the Coatings on the Basis of the Al-Si-N System; AIP Conference Proceedings; Vol. 1909 : Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures 2017 (AMHS’17)

Effect of Magnetron Deposition Conditions on the Structure, Phase Composition and Properties of the Coatings on the Basis of the Al-Si-N System; AIP Conference Proceedings; Vol. 1909 : Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures 2017 (AMHS’17)

Detalhes bibliográficos
Parent link:	AIP Conference Proceedings Vol. 1909 : Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures 2017 (AMHS’17).— 2017.— [020020, 4 p.]
Autor Corporativo:	Томский политехнический университет
Outros Autores:	Bozhko I. A. Irina Aleksandrovna, Rybalko E. V., Fedorishcheva M. V. Marina Vladimirovna, Sergeev V. P. Viktor Petrovich
Resumo:	Title screen Coatings on the basis of Al-Si-N system produced by the pulsed magnetron sputtering at different temperatures of the KV quartz glass substrate were carried out. It has been established by the X-ray analysis, that the composite coatings of the Al-Si-N system contain the AlN (hcp), [alpha]-Si[3]N[4] and [beta]-Si[3]N[4] phases, whose ratio depends on the temperature of the substrate during the deposition. Investigation of the optical properties has shown that the transmittance for all coatings is ~75-85%. The protective coatings of the Al-Si-N system produced by the pulsed magnetron deposition are characterized by high nanohardness values (~27 GPa) along with high values of the elastic recovery coefficient (Re>=0.70). Режим доступа: по договору с организацией-держателем ресурса
Idioma:	inglês
Publicado em:	2017
Assuntos:	электронный ресурс труды учёных ТПУ магнетронное осаждение структуры фазовый состав свойства покрытия кварцевые стекла рентгеновский анализ композиционные покрытия оптические свойства нанотвердость radiowave and microwave technology optical properties physical vapor deposition
Acesso em linha:	https://doi.org/10.1063/1.5013701
Formato:	Recurso Electrónico Capítulo de Livro
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=657088

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