Hydrophilic/hydrophobic surface modification impact on colloid lithography: Schottky-like defects, dislocation, and ideal distribution; Applied Surface Science; Vol. 433

Hydrophilic/hydrophobic surface modification impact on colloid lithography: Schottky-like defects, dislocation, and ideal distribution

Opis bibliograficzny
Parent link:Applied Surface Science
Vol. 433.— 2018.— [P. 443-448]
Korporacja: Национальный исследовательский Томский политехнический университет (ТПУ) Институт природных ресурсов (ИПР) Кафедра технологии органических веществ и полимерных материалов (ТОВПМ)
Kolejni autorzy: Burtsev V. Vasilii, Marchuk V. Valentina, Kugaevskiy A. Artem, Guselnikova O. A. Olga Andreevna, Elashnikov R. Roman, Milyutina (Miliutina) E. V. Elena Vadimovna, Postnikov P. S. Pavel Sergeevich, Svorcik V. Vaclav, Lyutakov O. Oleksy
Streszczenie:Title screen
Nano-spheres lithography is actually considered as a powerful tool to manufacture various periodic structures with a wide potential in the field of nano- and micro-fabrication. However, during self-assembling of colloid microspheres, various defects and mismatches can appear. In this work the size and quality of single-domains of closed-packed polystyrene (PS), grown up on thin Au layers modified by hydrophilic or hydrophobic functional groups via diazonium chemistry was studied. The effects of the surface modification on the quality and single-domain size of polystyrene (PS) microspheres array were investigated and discussed. Modified surfaces were characterized using the AFM and wettability tests. PS colloidal suspension was deposited using the drop evaporation method. Resulted PS microspheres array was characterized using the SEM, AFM and confocal microscopy technique.
Режим доступа: по договору с организацией-держателем ресурса
Język:angielski
Wydane: 2018
Hasła przedmiotowe:
электронный ресурс
труды учёных ТПУ
коллоидные вещества
литография
упорядоченные структуры
Dostęp online:https://doi.org/10.1016/j.apsusc.2017.10.055
Format: Elektroniczne Rozdział
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=656640

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