A comparative study on the properties of chromium coatings deposited by magnetron sputtering with hot and cooled target; Vacuum; Vol. 143
| Parent link: | Vacuum Vol. 143.— 2017.— [P. 479-485] |
|---|---|
| Corporate Author: | Национальный исследовательский Томский политехнический университет |
| Other Authors: | Sidelev D. V. Dmitry Vladimirovich, Bleykher (Bleicher) G. A. Galina Alekseevna, Bestetti M. Massimiliano, Krivobokov V. P. Valery Pavlovich, Vicenzo A. Antonello, Franz S. Silvia, Brunеlla M. F. Маria Franсеsсa |
| Summary: | Title screen This article reports on the analysis of energy flux density to the substrate and results of the detailed study of properties of Cr coatings deposited by magnetron sputtering with hot and cooled Cr targets. It was demonstrated that deposition rates of Cr films increase and particle flow density on the substrate changes by target sublimation. Heat radiation of the hot target leads to more rapid heating of the substrate and this energy flux has a main contribution in enhancement of total energy flux density on the substrate (from 0.06 to 0.43 W/cm2). As consequence, energy per deposited atom increases in 5.8 times for the hot Cr target sputtering even taking into account higher deposition rates. Cr films deposited by the cooled target sputtering have a (110) crystal texture, columnar microstructure, low surface roughness (∼2.66 nm) and hardness from 13.8 to 14.2 GPa. In the case of the hot target sputtering, the competitive crystal growth of (110) and (200) directions is observed, microstructure of the Cr films is denser and homogeneous, grain size increases up to 200-300 nm and film surface becomes coarse (Ra ∼11.75 nm), hardness of the Cr films drops by a factor of about 2. AM_Agreement |
| Language: | English |
| Published: |
2017
|
| Subjects: | |
| Online Access: | https://doi.org/10.1016/j.vacuum.2017.03.020 |
| Format: | Electronic Book Chapter |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=655913 |
Similar Items
Nickel and Chromium Deposition by Hot Target Magnetron Sputtering; Surface Modification of Materials by Ion Beams (SMMIB-2019)
Published: (2019)
Published: (2019)
Hot target magnetron sputtering enhanced by RF-ICP source for CrNx coatings deposition; Vacuum; Vol. 191
Published: (2021)
Published: (2021)
Chromium coatings deposited by cooled and hot target magnetron sputtering for accident tolerant nuclear fuel claddings; Surface and Coatings Technology; Vol. 389
Published: (2020)
Published: (2020)
High-rate deposition of chromium coatings by magnetron sputtering; Gas Discharge Plasmas and Their Applications (GDP 2019)
Published: (2019)
Published: (2019)
Hot target magnetron sputtering enhanced by RF-ICP source: Microstructure and functional properties of CrNx coatings; Vacuum; Vol. 200
Published: (2022)
Published: (2022)
Texture and microstructure development in rf magnetron sputter deposited hydroxyapatite coatings; Energy Fluxes and Radiation Effects (EFRE-2016)
Published: (2016)
Published: (2016)
High-rate magnetron sputtering with hot target; Surface and Coatings Technology; Vol. 308 : The 43rd International Conference on Metallurgical Coatings and Thin Films
Published: (2016)
Published: (2016)
Metal Coatings Deposition Using Hot Target Magnetrons; Surface Modification of Materials by Ion Beams (SMMIB-2019)
Published: (2019)
Published: (2019)
Magnetron sputtering with hot solid target: thermal processes and erosion; Acta Polytechnica; Vol. 56, № 6
Published: (2016)
Published: (2016)
Chromium films deposition by hot target high power pulsed magnetron sputtering: Deposition conditions and film properties; Surface and Coatings Technology; Vol. 375
Published: (2019)
Published: (2019)
Magnetron deposition of chromium nitride coatings using a hot chromium target: Influence of magnetron power on the deposition rate and elemental composition; Surface and Coatings Technology; Vol. 433
Published: (2022)
Published: (2022)
A comparative study on the properties of chromium coatings deposited by agnetron sputtering with hot and cooled cathode; Energy Fluxes and Radiation Effects (EFRE-2016)
Published: (2016)
Published: (2016)
Hot target magnetron sputtering for ferromagnetic films deposition; Surface and Coatings Technology; Vol. 334
Published: (2018)
Published: (2018)
Deposition of Cr films by hot target magnetron sputtering on biased substrates; Surface and Coatings Technology; Vol. 350
Published: (2018)
Published: (2018)
Angular thickness distribution and target utilization for hot Ni target magnetron sputtering; Vacuum; Vol. 160
by: Sidelev D. V. Dmitry Vladimirovich
Published: (2018)
by: Sidelev D. V. Dmitry Vladimirovich
Published: (2018)
Magnetron sputtering of hot silicon carbide target; Surface and Coatings Technology; Vol. 528
Published: (2026)
Published: (2026)
Evaporation factor in productivity increase of hot target magnetron sputtering systems; Vacuum; Vol. 132
Published: (2016)
Published: (2016)
Controlling the Properties of Metal Films Deposited Using Magnetron Sputtering Systems with Evaporative Targets; Surface Modification of Materials by Ion Beams (SMMIB-2019)
Published: (2019)
Published: (2019)
Surface erosion of hot Cr target and deposition rates of Cr coatings in high power pulsed magnetron sputtering; Surface and Coatings Technology; Vol. 354
Published: (2018)
Published: (2018)
Features of self-sustained magnetron sputtering of evaporating metal target; Gas Discharge Plasmas and Their Applications (GDP 2019)
Published: (2019)
Published: (2019)
Теоретические и экспериментальные исследования энергетических распределений вторичных ионов при распылении мишеней сложного состава ионами килоэлектронвольтных энергий: диссертация на соискание ученой степени кандидата физико-математических наук; Спец. 01.04.07
by: Никитенков Н. Н. Николай Николаевич
Published: (Томск, 1985)
by: Никитенков Н. Н. Николай Николаевич
Published: (Томск, 1985)
Multilayer chromium nitride/carbon coatings deposited by magnetron sputtering; Gas Discharge Plasmas and Their Applications (GDP 2019)
by: Sidelev D. V. Dmitry Vladimirovich
Published: (2019)
by: Sidelev D. V. Dmitry Vladimirovich
Published: (2019)
Formation of bioactive coatings by radio frequency magnetron sputtering using various calcium phosphate targets and working gases; Journal of Physics: Conference Series; Vol. 1281 : 14th InternationalConference on Films and Coatings (ICFC14)
by: Fedotkin A. Yu. Aleksandr Yurjevich
Published: (2019)
by: Fedotkin A. Yu. Aleksandr Yurjevich
Published: (2019)
Aluminum films deposition by magnetron sputtering systems: Influence of target state and pulsing unit; Journal of Physics: Conference Series; Vol. 741 : Optoelectronics, Photonics, Engineering and Nanostructures (Saint Petersburg OPEN 2016)
Published: (2016)
Published: (2016)
The energy flux onto substrate during coating deposition using magnetron with liquid metal target; Energy Fluxes and Radiation Effects (EFRE-2016)
by: Bleykher (Bleicher) G. A. Galina Alekseevna
Published: (2016)
by: Bleykher (Bleicher) G. A. Galina Alekseevna
Published: (2016)
Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate; IOP Conference Series: Materials Science and Engineering; Vol. 135 : Issues of Physics and Technology in Science, Industry and Medicine
Published: (2016)
Published: (2016)
Nickel-chromium (Ni–Cr) coatings deposited by magnetron sputtering for accident tolerant nuclear fuel claddings; Surface and Coatings Technology; Vol. 369
Published: (2019)
Published: (2019)
The properties of Cu films deposited by high rate magnetron sputtering from a liquid target; Vacuum; Vol. 169
Published: (2019)
Published: (2019)
Calcium Phosphate Targets for RF Magnetron Sputtering of Biocoatings; AIP Conference Proceedings; Vol. 2167 : Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures 2019 (AMHS'19)
Published: (2019)
Published: (2019)
Получение, свойства и применение тонких металлических пленок: доклады всесоюзной конференции
Published: (Киев, Наукова думка, 1971)
Published: (Киев, Наукова думка, 1971)
Cooling of a metal target after intense ion beam irradiation; Перспективы развития фундаментальных наук; Т. 1. Физика
by: Zhunussova A. B.
Published: (2016)
by: Zhunussova A. B.
Published: (2016)
Antibacterial PLGA and PCL membranes, modified by magnetron sputtering method of copper target; IOP Conference Series: Materials Science and Engineering; Vol. 1093 : Advanced Materials for Engineering and Functional Purposes (AMEFP 2020)
by: Badaraev A. D. Arsalan Dorzhievich
Published: (2021)
by: Badaraev A. D. Arsalan Dorzhievich
Published: (2021)
Magnetron sputtering of Si-Al-N nanocomposite coatings on quartz for protection against impacts of high speed microparticles; Vacuum; Vol. 143
Published: (2017)
Published: (2017)
Study of the propagation of an intense ion beam to the target; Vacuum; Vol. 198
Published: (2022)
Published: (2022)
The role of thermal processes and target evaporation in formation of self-sputtering mode for copper magnetron sputtering; Vacuum; Vol. 152
Published: (2018)
Published: (2018)
Energy and substance transfer in magnetron sputtering systems with liquid-phase target; Vacuum; Vol. 124
Published: (2016)
Published: (2016)
Magnetron deposition of coatings with evaporation of the target; Technical Physics; Vol. 60, №12
by: Bleykher (Bleicher) G. A. Galina Alekseevna
Published: (2015)
by: Bleykher (Bleicher) G. A. Galina Alekseevna
Published: (2015)
Features of copper coatings growth at high-rate deposition using magnetron sputtering systems with a liquid metal target; Surface and Coatings Technology; Vol. 324
Published: (2017)
Published: (2017)
Properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering method; Inorganic Materials: Applied Research; Vol. 8, iss. 1
by: An V. V. Vladimir Vilorievich
Published: (2017)
by: An V. V. Vladimir Vilorievich
Published: (2017)
Effect of material of the crucible on operation of magnetron sputtering system with liquid-phase target; Vacuum; Vol. 141
Published: (2017)
Published: (2017)
Similar Items
-
Nickel and Chromium Deposition by Hot Target Magnetron Sputtering; Surface Modification of Materials by Ion Beams (SMMIB-2019)
Published: (2019) -
Hot target magnetron sputtering enhanced by RF-ICP source for CrNx coatings deposition; Vacuum; Vol. 191
Published: (2021) -
Chromium coatings deposited by cooled and hot target magnetron sputtering for accident tolerant nuclear fuel claddings; Surface and Coatings Technology; Vol. 389
Published: (2020) -
High-rate deposition of chromium coatings by magnetron sputtering; Gas Discharge Plasmas and Their Applications (GDP 2019)
Published: (2019) -
Hot target magnetron sputtering enhanced by RF-ICP source: Microstructure and functional properties of CrNx coatings; Vacuum; Vol. 200
Published: (2022)