Power switching transistors based on gallium nitride epitaxial heterostructures; Russian Microelectronics; Vol. 46, iss. 3
| Parent link: | Russian Microelectronics Vol. 46, iss. 3.— 2017.— [P. 205–210] |
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| Autore principale: | |
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| Altri autori: | , |
| Riassunto: | Title screen The results of the development of power switching transistors based on epitaxial gallium nitride heterostructures to create an energy-efficient conversion technique are presented. The developed powerful GaN transistor operates in enrichment mode with unlocking threshold voltage Vth = +1.2 V and a maximum drain-source current Ids = 0.15 A/mm at the drain-source voltage Vds = +8 V. The drain-source breakdown voltage in the closed state is Vb = 300 V at the drain-source distance Lds = 8.5 μm and drain-source voltage Vds = 0 V. Режим доступа: по договору с организацией-держателем ресурса |
| Lingua: | inglese |
| Pubblicazione: |
2017
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| Soggetti: | |
| Accesso online: | http://dx.doi.org/10.1134/S1063739717020020 |
| Natura: | MixedMaterials Elettronico Capitolo di libro |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=655863 |