A technique for obtaining thermal resistance of the dielectric-substrate contact under high-intensity irradiation; Russian Physics Journal; Vol. 44, iss. 12
| Parent link: | Russian Physics Journal Vol. 44, iss. 12.— 2001.— [P. 1289-1299] |
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| 第一著者: | |
| その他の著者: | , |
| 要約: | Title screen Heating of dielectric materials is investigated under irradiation of specimens by periodically pulsed ion-beams. The solution to the equation of thermal conductivity yields constrained variations of the specimen's temperature around its average value, with the repetition rate being that of the radiation-pulse frequency. Initially, the average variation-period temperature is found to grow, while after saturation it approaches a quasi-stationary value controlled entirely by the thermal resistance of the specimen-substrate contact under the same irradiation conditions. A method for the time-averaged dielectric temperature under saturation is proposed. Using this method, an express-technique for calculating thermal resistance of the dielectric-substrate contact is offered. It is based on periodically pulsed heating of the dielectric specimen by a moderate-density ion beam and precision measurements of the its average temperature. The error of the express technique is evaluated and so is its applicability range. A hypothesis is put forward that proceeding form this new method for thermal resistance one may determine the energy lost in ion sputtering. Режим доступа: по договору с организацией-держателем ресурса |
| 言語: | 英語 |
| 出版事項: |
2001
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| 主題: | |
| オンライン･アクセス: | http://dx.doi.org/10.1023/A:1015792013118 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=655623 |