The influence of repetitively pulsed plasma immersion low energy ion implantation on TiN coating formation and properties

Bibliographic Details
Parent link:Journal of Physics: Conference Series
Vol. 830 : Energy Fluxes and Radiation Effects 2016.— 2017.— [012103, 6 p.]
Corporate Author: Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Лаборатория № 22
Other Authors: Sivin D. O. Denis Olegovich, Ananin P. S. Petr Semenovich, Dektyarev S. V. Sergey Valentinovich, Ryabchikov A. I. Aleksandr Ilyich, Shevelev A. E. Aleksey Eduardovich
Summary:Title screen
Application of high frequency short pulse plasma immersion low energy ion implantation for titanium nitride coating deposition using vacuum arc metal plasma and hot-cathode gas-discharge plasma on R6M5 alloy was investigated. Implementation of negative repetitively pulsed bias with bias amplitude 2 kV, pulse duration 5 [mu]s and pulse frequency 105 Hz leads to 6.2-fold decrease of vacuum arc macroparticle surface density for macroparticles with diameter less than 0.5 [mu]m. Ion sputtering due coating deposition reduces the production rate approximately by 30%. It was found that with bias amplitude range from 1.1 to 1.4 kV and pulse duration 5 [mu]s yields to formation of coatings with local hardness up to 40 GPa. This paper presents the results of experimental studies of adhesion strength, tribological properties and surface morphology of deposited TiN coatings.
Published: 2017
Series:Modification of materials with particle beams and plasma flows
Subjects:
Online Access:http://dx.doi.org/10.1088/1742-6596/830/1/012103
http://earchive.tpu.ru/handle/11683/39489
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=654921

MARC

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200 1 |a The influence of repetitively pulsed plasma immersion low energy ion implantation on TiN coating formation and properties  |f D. O. Sivin [et al.] 
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300 |a Title screen 
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330 |a Application of high frequency short pulse plasma immersion low energy ion implantation for titanium nitride coating deposition using vacuum arc metal plasma and hot-cathode gas-discharge plasma on R6M5 alloy was investigated. Implementation of negative repetitively pulsed bias with bias amplitude 2 kV, pulse duration 5 [mu]s and pulse frequency 105 Hz leads to 6.2-fold decrease of vacuum arc macroparticle surface density for macroparticles with diameter less than 0.5 [mu]m. Ion sputtering due coating deposition reduces the production rate approximately by 30%. It was found that with bias amplitude range from 1.1 to 1.4 kV and pulse duration 5 [mu]s yields to formation of coatings with local hardness up to 40 GPa. This paper presents the results of experimental studies of adhesion strength, tribological properties and surface morphology of deposited TiN coatings. 
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463 0 |0 (RuTPU)RU\TPU\network\20593  |t Vol. 830 : Energy Fluxes and Radiation Effects 2016  |o 5th International Congress, 2–7 October 2016, Tomsk, Russian Federation  |o [materials]  |f National Research Tomsk Polytechnic University (TPU) ; eds. M. V. Trigub G. E. Osokin ; A. S. Konovod  |v [012103, 6 p.]  |d 2017 
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701 1 |a Ananin  |b P. S.  |c physicist  |c senior researcher of Tomsk Polytechnic University, candidate of physical and mathematical sciences  |f 1942-  |g Petr Semenovich  |2 stltpush  |3 (RuTPU)RU\TPU\pers\35673 
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