Study on the influence of the magnetron power supply on the properties of the Silicon Nitride films; Journal of Physics: Conference Series; Vol. 789 : Low temperature Plasma in the Processes of Functional Coating Preparation
| Parent link: | Journal of Physics: Conference Series Vol. 789 : Low temperature Plasma in the Processes of Functional Coating Preparation.— 2017.— [012028, 6 p.] |
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| সংস্থা লেখক: | , |
| অন্যান্য লেখক: | , , , , , |
| সংক্ষিপ্ত: | Title screen Silicon nitride (Si3N4) films were deposited by magnetron sputtering of silicon target in (Ar+N2) atmosphere with refractive index 1.95 - 2.05. The results of Fourier transform infrared (FTIR) spectrophotometry showed Si-N bonds in the thin films with concentration 2.4110[23]- 3.4810[23]cm[-3]. Dependences of deposition rate, optical characteristics and surface morphology on rate of N2 flow and properties of magnetron power supply. |
| ভাষা: | ইংরেজি |
| প্রকাশিত: |
2017
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| বিষয়গুলি: | |
| অনলাইন ব্যবহার করুন: | http://dx.doi.org/10.1088/1742-6596/789/1/012028 |
| বিন্যাস: | MixedMaterials বৈদ্যুতিক গ্রন্থের অধ্যায় |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=654307 |