Influence of Repetitively Pulsed Negative Bias Parameters on Macroparticle Surface Density

Influence of Repetitively Pulsed Negative Bias Parameters on Macroparticle Surface Density

Detalles Bibliográficos
Parent link:	Journal of Industrial Pollution Control Vol. 32, iss. 2.— 2016.— [P. 467-471]
Autor Corporativo:	Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Лаборатория № 22
Outros autores:	Ryabchikov A. I. Aleksandr Ilyich, Sivin D. O. Denis Olegovich, Bumagina A. I. Anna Ivanovna, Shevelev A. E. Aleksey Eduardovich, Shulepov I. A. Ivan Anisimovich, Ananin P. S. Petr Semenovich
Summary:	Title screen The results of an experimental study of the influence of a substrate negative bias with various pulse widths and pulse repetition rates ranging from several Hz to 105 Hz on the macroparticle (MP) accumulation on substrate immersed in a DC titanium vacuum arc plasma are presented. It was found that the rate of MP deposition on the substrate surface depends significantly on the bias pulse parameters and the processing time. The influence of the multiple recharging of MPs in the plasma and the sheath on the reflection of these MPs in a sheath electric field is discussed.
Publicado:	2016
Subjects:	электронный ресурс труды учёных ТПУ substrate negative bias macroparticle accumulation microdroplets vacuum arc plasma gaseous plasma микрокапли вакуумно-дуговая плазма газовая плазма подложки отрицательное смещение
Acceso en liña:	http://www.icontrolpollution.com/articles/influence-of-repetitively-pulsed-negative-bias-parameters-on-macroparticle-surface-density-.php?aid=79550
Formato:	Electrónico Capítulo de libro
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=654283

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