Modeling of carbon penetration into silicon structure under the action of pulsed high-intensity ion beam; Surface and Coatings Technology; Vol. 306, Pt. A : Surface Modification of Materials by Ion Beams (SMMIB 2015)
| Parent link: | Surface and Coatings Technology Vol. 306, Pt. A : Surface Modification of Materials by Ion Beams (SMMIB 2015).— 2016.— [P. 54–57] |
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| Streszczenie: | Title screen The action of high-intensity beam of carbon ions on a silicon sample is studied by means of a numerical modelling revealing formation of the in-depth carbon concentration profile in crystal lattice of silicon. We investigated three ways of the profile forming: short-pulsed ion implantation, recoil atoms mechanism and thermal diffusion of the carbon atoms adsorbed on the silicon surface. The latter is the result of high temperature gradient associated with the action of pulsed high-intensity ion beam. It is argued that the diffusion process plays the major role in forming of the concentration profile in the pre-surface layer of a silicon sample. Режим доступа: по договору с организацией-держателем ресурса |
| Język: | angielski |
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2016
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| Dostęp online: | http://dx.doi.org/10.1016/j.surfcoat.2016.04.050 |
| Format: | Elektroniczne Rozdział |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=653050 |