Use of a thin liquid film moving under the action of gas flow in a mini-channel for removing high heat fluxes
| Parent link: | MATEC Web of Conferences Vol. 92 : Thermophysical Basis of Energy Technologies (TBET-2016).— 2017.— [01037, 4 p.] |
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| 団体著者: | |
| その他の著者: | , , , |
| 要約: | Title screen Intensively evaporating liquid films shear-driven in a mini- or micro-channel under the action of cocurrent gas flow are promising for the use in modern cooling systems of semiconductor devices. In this work, we investigated the influence of liquid and gas flow rates on the critical heat flux in a locally heated film of water, moving under the action of air flow in a mini-channel. In experiments a record value of critical heat flux of 870 W/cm{2} was reached. Heat spreading into the substrate and heat losses to the atmosphere in total do not exceed 25 % at heat fluxes above 400 W/cm{2} . A comparison with the critical heat flux for water flow boiling in the channel shows that, for shear-driven liquid films the critical heat flux is almost an order of magnitude higher. |
| 言語: | 英語 |
| 出版事項: |
2017
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| 主題: | |
| オンライン･アクセス: | http://dx.doi.org/10.1051/matecconf/20179201037 http://earchive.tpu.ru/handle/11683/36692 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=652984 |
MARC
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| 200 | 1 | |a Use of a thin liquid film moving under the action of gas flow in a mini-channel for removing high heat fluxes |f D. V. Zaitsev [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 10 tit.] | ||
| 330 | |a Intensively evaporating liquid films shear-driven in a mini- or micro-channel under the action of cocurrent gas flow are promising for the use in modern cooling systems of semiconductor devices. In this work, we investigated the influence of liquid and gas flow rates on the critical heat flux in a locally heated film of water, moving under the action of air flow in a mini-channel. In experiments a record value of critical heat flux of 870 W/cm{2} was reached. Heat spreading into the substrate and heat losses to the atmosphere in total do not exceed 25 % at heat fluxes above 400 W/cm{2} . A comparison with the critical heat flux for water flow boiling in the channel shows that, for shear-driven liquid films the critical heat flux is almost an order of magnitude higher. | ||
| 461 | 0 | |0 (RuTPU)RU\TPU\network\4526 |t MATEC Web of Conferences | |
| 463 | 0 | |0 (RuTPU)RU\TPU\network\18128 |t Vol. 92 : Thermophysical Basis of Energy Technologies (TBET-2016) |o Proceedings of the Conference, October 26-28, 2016, Tomsk, Russia |f National Research Tomsk Polytechnic University (TPU) ; eds. G. V. Kuznetsov ; P. A. Strizhak ; A. O. Zhdanova |v [01037, 4 p.] |d 2017 | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a тонкие пленки | |
| 610 | 1 | |a жидкости | |
| 610 | 1 | |a потоки газов | |
| 610 | 1 | |a тепловые потоки | |
| 610 | 1 | |a охлаждение | |
| 610 | 1 | |a полупроводниковые приборы | |
| 701 | 1 | |a Zaitsev |b D. V. |c physicist |c researcher of Tomsk Polytechnic University, candidate of physical and mathematical sciences |f 1974- |g Dmitry Valerievich |2 stltpush |3 (RuTPU)RU\TPU\pers\36024 | |
| 701 | 1 | |a Tkachenko |b E. |g Egor | |
| 701 | 1 | |a Orlik |b E. |g Evgeny | |
| 701 | 1 | |a Kabov |b O. |g Oleg | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Энергетический институт (ЭНИН) |b Кафедра атомных и тепловых электростанций (АТЭС) |h 118 |2 stltpush |3 (RuTPU)RU\TPU\col\18683 |
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| 856 | 4 | |u http://dx.doi.org/10.1051/matecconf/20179201037 | |
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