A gigawatt power pulsed ion beam generator for industrial applications; Surface and Coatings Technology; Vol. 228, suppl. 1 : Plasma Surface Engineering (AEPSE 2011)

A gigawatt power pulsed ion beam generator for industrial applications; Surface and Coatings Technology; Vol. 228, suppl. 1 : Plasma Surface Engineering (AEPSE 2011)

Xehetasun bibliografikoak
Parent link:Surface and Coatings Technology
Vol. 228, suppl. 1 : Plasma Surface Engineering (AEPSE 2011).— 2013.— [P. 382-384]
Egile nagusia: Pushkarev A. I. Aleksandr Ivanovich
Erakunde egilea: Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ)
Beste egile batzuk: Isakova Yu. I. Yulia Ivanovna
Gaia:Title screen
The results of a comprehensive study of a gigawatt level power pulsed ion beam used for material modification are presented. The ion beam is formed using a diode with self-magnetic insulation. The study was performed using the TEMP-4M accelerator in double pulse formation mode. The ion current density is 30–300 A/cm2 (for different designs of diodes), and the beam is composed of protons (15%) and carbon ions (85%). It was shown that a diode with planar configuration generates an ion beam with a fairly homogeneous energy density over a cross section of 80 cm2; the energy density is 0.3–0.4 J/cm2 and the fluence is 2 Ч 1013 cm- 2 per pulse. A diode with focusing geometry forms an ion beam with an energy density of 2–2.5 J/cm2 at the focus and a pulse energy of 80–100 J.
Режим доступа: по договору с организацией-держателем ресурса
Hizkuntza:ingelesa
Argitaratua: 2013
Gaiak:
электронный ресурс
труды учёных ТПУ
ионные пучки
диоды
магнитная изоляция
Sarrera elektronikoa:http://dx.doi.org/10.1016/j.surfcoat.2012.05.094
Formatua: Baliabide elektronikoa Liburu kapitulua
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=652562

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