A gigawatt power pulsed ion beam generator for industrial applications; Surface and Coatings Technology; Vol. 228, suppl. 1 : Plasma Surface Engineering (AEPSE 2011)
| Parent link: | Surface and Coatings Technology Vol. 228, suppl. 1 : Plasma Surface Engineering (AEPSE 2011).— 2013.— [P. 382-384] |
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| Sumario: | Title screen The results of a comprehensive study of a gigawatt level power pulsed ion beam used for material modification are presented. The ion beam is formed using a diode with self-magnetic insulation. The study was performed using the TEMP-4M accelerator in double pulse formation mode. The ion current density is 30–300 A/cm2 (for different designs of diodes), and the beam is composed of protons (15%) and carbon ions (85%). It was shown that a diode with planar configuration generates an ion beam with a fairly homogeneous energy density over a cross section of 80 cm2; the energy density is 0.3–0.4 J/cm2 and the fluence is 2 Ч 1013 cm- 2 per pulse. A diode with focusing geometry forms an ion beam with an energy density of 2–2.5 J/cm2 at the focus and a pulse energy of 80–100 J. Режим доступа: по договору с организацией-держателем ресурса |
| Lenguaje: | inglés |
| Publicado: |
2013
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| Materias: | |
| Acceso en línea: | http://dx.doi.org/10.1016/j.surfcoat.2012.05.094 |
| Formato: | MixedMaterials Electrónico Capítulo de libro |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=652562 |
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| 200 | 1 | |a A gigawatt power pulsed ion beam generator for industrial applications |f A. I. Pushkarev, Yu. I. Isakova | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 12 tit.] | ||
| 330 | |a The results of a comprehensive study of a gigawatt level power pulsed ion beam used for material modification are presented. The ion beam is formed using a diode with self-magnetic insulation. The study was performed using the TEMP-4M accelerator in double pulse formation mode. The ion current density is 30–300 A/cm2 (for different designs of diodes), and the beam is composed of protons (15%) and carbon ions (85%). It was shown that a diode with planar configuration generates an ion beam with a fairly homogeneous energy density over a cross section of 80 cm2; the energy density is 0.3–0.4 J/cm2 and the fluence is 2 Ч 1013 cm- 2 per pulse. A diode with focusing geometry forms an ion beam with an energy density of 2–2.5 J/cm2 at the focus and a pulse energy of 80–100 J. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | 1 | |t Surface and Coatings Technology | |
| 463 | 1 | |t Vol. 228, suppl. 1 : Plasma Surface Engineering (AEPSE 2011) |v [P. 382-384] |o proceedings of the 8th Asian-European International Conference |d 2013 | |
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| 610 | 1 | |a магнитная изоляция | |
| 700 | 1 | |a Pushkarev |b A. I. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences, Senior researcher |f 1954- |g Aleksandr Ivanovich |3 (RuTPU)RU\TPU\pers\32701 |9 16587 | |
| 701 | 1 | |a Isakova |b Yu. I. |c physicist |c Associate Professor of Tomsk Polytechnic University, Candidate of Technical Sciences |f 1988- |g Yulia Ivanovna |3 (RuTPU)RU\TPU\pers\32700 |9 16586 | |
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