High-rate magnetron sputtering with hot target
| Parent link: | Surface and Coatings Technology Vol. 308 : The 43rd International Conference on Metallurgical Coatings and Thin Films.— 2016.— [P. 168-173] |
|---|---|
| その他の著者: | , , , |
| 要約: | Title screen Chromium films were deposited by cooled and hot target magnetron sputtering techniques with unbalanced magnetic field configuration at equal target power density. The dependence of deposition rates of Cr films by the hot target magnetron sputtering on the power density was a non-linear at 27.5–31.5 W/cm2. The optical emission studies indicated the enhancement of deposition rates due to the evaporation of the hot Cr target. The chromium film structure was strongly depended on the factor of «hot target» and the target power density. Cr films were structured to (110) direction in the case of the hot target sputtering, for cooled target configuration – the preferred orientation was changed from (110) to (200) with the power density. Cr+ to Cr ratio and heat flow from the cathode to the substrate influenced on the coating hardness and adhesion. The Cr films with 9.84–12.79 GPa and the non-cracking behavior (up to 15 N) were obtained. Режим доступа: по договору с организацией-держателем ресурса |
| 言語: | 英語 |
| 出版事項: |
2016
|
| 主題: | |
| オンライン･アクセス: | http://dx.doi.org/10.1016/j.surfcoat.2016.06.096 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=652556 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 652556 | ||
| 005 | 20250902160529.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\17885 | ||
| 090 | |a 652556 | ||
| 100 | |a 20170117d2016 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a High-rate magnetron sputtering with hot target |f D. V. Sidelev [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 35 tit.] | ||
| 330 | |a Chromium films were deposited by cooled and hot target magnetron sputtering techniques with unbalanced magnetic field configuration at equal target power density. The dependence of deposition rates of Cr films by the hot target magnetron sputtering on the power density was a non-linear at 27.5–31.5 W/cm2. The optical emission studies indicated the enhancement of deposition rates due to the evaporation of the hot Cr target. The chromium film structure was strongly depended on the factor of «hot target» and the target power density. Cr films were structured to (110) direction in the case of the hot target sputtering, for cooled target configuration – the preferred orientation was changed from (110) to (200) with the power density. Cr+ to Cr ratio and heat flow from the cathode to the substrate influenced on the coating hardness and adhesion. The Cr films with 9.84–12.79 GPa and the non-cracking behavior (up to 15 N) were obtained. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | 1 | |t Surface and Coatings Technology | |
| 463 | 1 | |t Vol. 308 : The 43rd International Conference on Metallurgical Coatings and Thin Films |v [P. 168-173] |d 2016 | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a магнетронное распыление | |
| 610 | 1 | |a высокие скорости | |
| 610 | 1 | |a пленки | |
| 610 | 1 | |a хром | |
| 610 | 1 | |a мишени | |
| 610 | 1 | |a испарение | |
| 701 | 1 | |a Sidelev |b D. V. |c physicist |c engineer of Tomsk Polytechnic University |f 1991- |g Dmitry Vladimirovich |3 (RuTPU)RU\TPU\pers\34524 |9 17905 | |
| 701 | 1 | |a Bleykher (Bleicher) |b G. A. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of Physical and Mathematical Sciences |f 1961- |g Galina Alekseevna |3 (RuTPU)RU\TPU\pers\31496 | |
| 701 | 1 | |a Krivobokov |b V. P. |c Russian physicist |c professor of Tomsk Polytechnic University (TPU), Doctor of Physical and Mathematical Sciences (DSc) |f 1948- |g Valery Pavlovich |3 (RuTPU)RU\TPU\pers\30416 |9 14757 | |
| 701 | 1 | |a Koyshybaeva |b Zh. K. |g Zhanymgul Koyshybaykyzy | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Физико-технический институт (ФТИ) |b Кафедра экспериментальной физики (ЭФ) |3 (RuTPU)RU\TPU\col\21255 |
| 801 | 2 | |a RU |b 63413507 |c 20170117 |g RCR | |
| 856 | 4 | |u http://dx.doi.org/10.1016/j.surfcoat.2016.06.096 | |
| 942 | |c CF | ||