Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology; AIP Conference Proceedings; Vol. 1772 : Prospects of Fundamental Sciences Development (PFSD-2016)
| Parent link: | AIP Conference Proceedings Vol. 1772 : Prospects of Fundamental Sciences Development (PFSD-2016).— 2016.— [040007, 5 p.] |
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| المؤلف الرئيسي: | |
| مؤلف مشترك: | |
| مؤلفون آخرون: | , |
| الملخص: | Title screen The effect of treatment by reactive ion etching in an argon atmosphere, and hydrogen plasma etching in a glow discharge plasma on the surface of the diamond films was investigated. Diamond films were deposited by the Chemical Vapor Deposition method on the hard alloy VK-8 substrates. The crystallites direction under the influence of argon ion beam processing was changed by 45 degrees from the original. The surface morphology becomes more developed (an average value of 20%) by etching in a glow discharge plasma in an atmosphere of hydrogen. Raman spectroscopy, Scanning Electron Microscope and Atomic Force Microscopy were used to determine the phase and microstructure composition of deposited films. Режим доступа: по договору с организацией-держателем ресурса |
| اللغة: | الإنجليزية |
| منشور في: |
2016
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| سلاسل: | High energy processes and external exposure of materials |
| الموضوعات: | |
| الوصول للمادة أونلاين: | http://dx.doi.org/10.1063/1.4964566 http://earchive.tpu.ru/handle/11683/35005 |
| التنسيق: | الكتروني فصل الكتاب |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=652125 |
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| 200 | 1 | |a Research of reactive ion and plasma-chemical etching effect on diamond coating surface morphology |f V. V. Okhotnikov, S. A. Linnik, A. V. Gaydaychuk | |
| 203 | |a Text |c electronic | ||
| 225 | 1 | |a High energy processes and external exposure of materials | |
| 300 | |a Title screen | ||
| 320 | |a [References: 13 tit.] | ||
| 330 | |a The effect of treatment by reactive ion etching in an argon atmosphere, and hydrogen plasma etching in a glow discharge plasma on the surface of the diamond films was investigated. Diamond films were deposited by the Chemical Vapor Deposition method on the hard alloy VK-8 substrates. The crystallites direction under the influence of argon ion beam processing was changed by 45 degrees from the original. The surface morphology becomes more developed (an average value of 20%) by etching in a glow discharge plasma in an atmosphere of hydrogen. Raman spectroscopy, Scanning Electron Microscope and Atomic Force Microscopy were used to determine the phase and microstructure composition of deposited films. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | 0 | |0 (RuTPU)RU\TPU\network\4816 |t AIP Conference Proceedings | |
| 463 | 0 | |0 (RuTPU)RU\TPU\network\17119 |t Vol. 1772 : Prospects of Fundamental Sciences Development (PFSD-2016) |o XIII International Conference of Students and Young Scientists, 26–29 April 2016, Tomsk, Russia |o [proceedings] |f National Research Tomsk Polytechnic University (TPU) ; eds. A. Yu. Godymchuk (Godimchuk) ; L. Rieznichenko |v [040007, 5 p.] |d 2016 | |
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| 610 | 1 | |a плазмохимическое травление | |
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| 610 | 1 | |a поверхности | |
| 610 | 1 | |a морфология | |
| 610 | 1 | |a алмазные пленки | |
| 610 | 1 | |a химическое осаждение | |
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| 610 | 1 | |a сканирующая электронная микроскопия | |
| 610 | 1 | |a атомно-силовая микроскопия | |
| 610 | 1 | |a фазовый состав | |
| 610 | 1 | |a микроструктуры | |
| 700 | 1 | |a Okhotnikov |b V. V. |c physicist |c engineer of Tomsk Polytechnic University |f 1992- |g Vitaly Vladimirovich |3 (RuTPU)RU\TPU\pers\36453 | |
| 701 | 1 | |a Linnik |b S. A. |c physicist |c Engineer-Researcher of Tomsk Polytechnic University |f 1985- |g Stepan Andreevich |3 (RuTPU)RU\TPU\pers\32877 |9 16725 | |
| 701 | 1 | |a Gaydaychuk |b A. V. |c physicist |c Postgraduate, Engineer - Researcher of Tomsk Polytechnic University |f 1984- |g Alexander Valerievich |3 (RuTPU)RU\TPU\pers\32876 |9 16724 | |
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