Influence of negative bias pulse parameters on accumulation of macroparticles on the substrate immersed in titanium vacuum arc plasma
| Parent link: | Surface and Coatings Technology Vol. 306, Pt. A : Surface Modification of Materials by Ion Beams [SMMIB2015].— 2016.— [P. 251-256] |
|---|---|
| সংস্থা লেখক: | |
| অন্যান্য লেখক: | , , , , , , |
| সংক্ষিপ্ত: | Title screen The paper presents the results of an experimental study of the influence of a substrate negative bias with various pulse lengths and pulse repetition rates ranging from several pulses per second to 105 pulses per second on the macroparticle accumulation on the substrate immersed in DC titanium vacuum arc plasma. It was found that the increase of the bias pulse frequency from 10 up to 105 pulses per second at pulse length 7 µs, as well as bias pulse lengths from 5 µs to 25 µs at fixed frequency of 30 pulses per second at bias pulse amplitude ?2 kV and ion-plasma substrate treatment time 30 s led to gradual almost linear up to 3-fold decrease of the surface number density of MPs on the substrate immersed in titanium vacuum arc plasma at plasma ion saturation current density of 10 mA/cm2. The decrease of ion current density down to 3.5 mA/cm2 leads to the reduction of the macroparticle suppression efficiency. The influence of multiple recharging of the macroparticles in plasma and the sheath on the reflection of these macroparticles in the sheath electric field is discussed. It was experimentally found that the shape of MPs and their adhesion to the substrate surface strongly depends on bias pulse, plasma and substrate parameters. It was shown that cooled vacuum arc MPs can be melted in high-voltage plasma sheath. Режим доступа: по договору с организацией-держателем ресурса |
| প্রকাশিত: |
2016
|
| বিষয়গুলি: | |
| অনলাইন ব্যবহার করুন: | http://dx.doi.org/10.1016/j.surfcoat.2016.06.026 |
| বিন্যাস: | বৈদ্যুতিক গ্রন্থের অধ্যায় |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=652005 |
MARC
| LEADER | 00000naa0a2200000 4500 | ||
|---|---|---|---|
| 001 | 652005 | ||
| 005 | 20250829161718.0 | ||
| 035 | |a (RuTPU)RU\TPU\network\17268 | ||
| 090 | |a 652005 | ||
| 100 | |a 20161130d2016 k||y0rusy50 ba | ||
| 101 | 0 | |a eng | |
| 105 | |a y z 100zy | ||
| 135 | |a drcn ---uucaa | ||
| 181 | 0 | |a i | |
| 182 | 0 | |a b | |
| 200 | 1 | |a Influence of negative bias pulse parameters on accumulation of macroparticles on the substrate immersed in titanium vacuum arc plasma |f A. I. Ryabchikov [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: 25 tit.] | ||
| 330 | |a The paper presents the results of an experimental study of the influence of a substrate negative bias with various pulse lengths and pulse repetition rates ranging from several pulses per second to 105 pulses per second on the macroparticle accumulation on the substrate immersed in DC titanium vacuum arc plasma. It was found that the increase of the bias pulse frequency from 10 up to 105 pulses per second at pulse length 7 µs, as well as bias pulse lengths from 5 µs to 25 µs at fixed frequency of 30 pulses per second at bias pulse amplitude ?2 kV and ion-plasma substrate treatment time 30 s led to gradual almost linear up to 3-fold decrease of the surface number density of MPs on the substrate immersed in titanium vacuum arc plasma at plasma ion saturation current density of 10 mA/cm2. The decrease of ion current density down to 3.5 mA/cm2 leads to the reduction of the macroparticle suppression efficiency. The influence of multiple recharging of the macroparticles in plasma and the sheath on the reflection of these macroparticles in the sheath electric field is discussed. It was experimentally found that the shape of MPs and their adhesion to the substrate surface strongly depends on bias pulse, plasma and substrate parameters. It was shown that cooled vacuum arc MPs can be melted in high-voltage plasma sheath. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | 1 | |t Surface and Coatings Technology | |
| 463 | 1 | |t Vol. 306, Pt. A : Surface Modification of Materials by Ion Beams [SMMIB2015] |o 19th International Conference |v [P. 251-256] |d 2016 | |
| 610 | 1 | |a электронный ресурс | |
| 610 | 1 | |a труды учёных ТПУ | |
| 610 | 1 | |a вакуумно-дуговая плазма | |
| 610 | 1 | |a макрочастицы | |
| 610 | 1 | |a адгезия | |
| 701 | 1 | |a Ryabchikov |b A. I. |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |c physicist |f 1950- |g Aleksandr Ilyich |3 (RuTPU)RU\TPU\pers\30912 | |
| 701 | 1 | |a Ananin |b P. S. |c physicist |c senior researcher of Tomsk Polytechnic University, candidate of physical and mathematical sciences |f 1942- |g Petr Semenovich |3 (RuTPU)RU\TPU\pers\35673 | |
| 701 | 1 | |a Sivin |b D. O. |c physicist |c Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences |f 1978- |g Denis Olegovich |3 (RuTPU)RU\TPU\pers\34240 | |
| 701 | 1 | |a Dektyarev |b S. V. |c physicist |c design engineer of Tomsk Polytechnic University |f 1957- |g Sergey Valentinovich |3 (RuTPU)RU\TPU\pers\35672 | |
| 701 | 1 | |a Ivanova |b A. I. |c physicist |c Associate Scientist of Tomsk Polytechnic University |f 1987- |g Anna Ivanovna |3 (RuTPU)RU\TPU\pers\36986 |9 20002 | |
| 701 | 1 | |a Shevelev |b A. E. |c Physicist |c Engineer of Tomsk Polytechnic University |f 1990- |g Aleksey Eduardovich |3 (RuTPU)RU\TPU\pers\36832 | |
| 701 | 1 | |a Andriyashin |b D. A. |g Dmitry Aleksandrovich | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |b Физико-технический институт (ФТИ) |b Лаборатория № 22 |3 (RuTPU)RU\TPU\col\19225 |
| 801 | 2 | |a RU |b 63413507 |c 20191106 |g RCR | |
| 856 | 4 | |u http://dx.doi.org/10.1016/j.surfcoat.2016.06.026 | |
| 942 | |c CF | ||