Optical Absorption Peculiarities of Al-Si-N Coatings Produced by Magnetron Sputtering

Dades bibliogràfiques
Parent link:Key Engineering Materials: Scientific Journal
Vol. 712 : Advanced Materials for Technical and Medical Purpose (AMTMP 2016).— 2016.— [P. 3-8]
Autor corporatiu: Национальный исследовательский Томский политехнический университет (ТПУ) Энергетический институт (ЭНИН) Кафедра электроснабжения промышленных предприятий (ЭПП), Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Лаборатория № 1
Altres autors: Kabyshev A. V. Alexander Vasilievich, Konusov F. V. Fedor Valerievich, Lauk A. L. Aleksandr Lukyanovich, Lebedinsky A. M. Aleksey Mikhaylovich, Legostaev V. N. Victor, Smolyanskiy (Smolyansky, Smolyanskii) E. A. Egor Aleksandrovich
Sumari:Title screen
In this paper the optical absorption characteristics of Al–Si–N coatings, deposited by magnetron sputtering on the substrates from silicon single crystals and glass were studied. The influence of conditions deposition on optical properties has been determined. The characteristics of interband and exponential absorption are determined by influence of localized states (LS) of defects continuously distributed in the band gap (BG) and reflect the influence on properties of crystalline and amorphous components material of coatings. The interband absorption is realized via the allowed indirect transitions through the optical gap 2.7–2.8 eV and direct transitions through the gap 3.8–3.96 eV. The interrelations between the parameters of interband and exponential absorption are typical for the naterials, whose properties are determined by a static and/or dynamic disordering of the crystal lattice by the defects of a different nature. Maximal average value of the BG width is 4.8–5.1 eV in the scope of semiclassical analysis applied to amorphous and strongly defective materials. The optical parameters of deposited coatings are changed in correlation with a changing of the mechanical characteristics in dependency on the nitrogen pressure.
Режим доступа: по договору с организацией-держателем ресурса
Publicat: 2016
Col·lecció:Electrophysical and Electrochemical Methods and Technologies of Materials Treatment
Matèries:
Accés en línia:http://dx.doi.org/10.4028/www.scientific.net/KEM.712.3
Format: Electrònic Capítol de llibre
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=651237

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