The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering; Vacuum; Vol. 134

The oxygen-deficient TiO2 films deposited by a dual magnetron sputtering; Vacuum; Vol. 134

Chi tiết về thư mục
Parent link:	Vacuum.— , 1951- Vol. 134.— 2016.— [P. 29-32]
Tác giả của công ty:	Национальный исследовательский Томский политехнический университет Физико-технический институт Кафедра экспериментальной физики
Tác giả khác:	Sidelev D. V. Dmitry Vladimirovich, Yuriev Yu. N. Yuri Nikolaevich, Krivobokov V. P. Valery Pavlovich, Erofeev E. V. Evgeny Viktorovich, Penkova O. V. Olga Valerjevna, Novikov V. A. Vadim Aleksandrovich
Tóm tắt:	Title screen This paper describes the deposition of the oxygen-deficient TiO2 films by the dual magnetron sputtering with different magnetic field configurations. The XRD survey and calculations of optical band gap demonstrate that the TiO2 films are polycrystalline with a mixture of anatase and rutile phases and have a low content of unbound Ti atoms. SEM and AFM investigations result in a columnar structure of the TiO2 films in the case of the mirror magnetic field configuration sputtering. For the closed configuration magnetic field, more intense ion bombardment of the growing films leads to the films densification. Optical and photocatalytic properties of the TiO2 films are strongly depended on the magnetic field configuration and determined by the films structure. The obtained results are interesting to modify the deposition technology of low-e coatings and solar materials. Режим доступа: по договору с организацией-держателем ресурса
Ngôn ngữ:	Tiếng Anh
Được phát hành:	2016
Những chủ đề:	электронный ресурс труды учёных ТПУ магнетронное распыление диоксиды тонкие пленки оптические свойства
Truy cập trực tuyến:	http://dx.doi.org/10.1016/j.vacuum.2016.09.007
Định dạng:	Điện tử Chương của sách
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=650439

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