Synthis and Phisical And Chemical; Properties of SiO[2]-B[2]O[3] and SiO[2]-P[2]O[5] Thin Film Systems and Powders

Bibliographic Details
Parent link:IOP Conference Series: Materials Science and Engineering
Vol. 142 : Innovative Technologies in Engineering.— 2016.— [012066, 8 p.]
Corporate Author: Национальный исследовательский Томский политехнический университет (ТПУ) Юргинский технологический институт (филиал) (ЮТИ) Кафедра безопасности жизнедеятельности, экологии и физического воспитания (БЖДЭФВ)
Other Authors: Malchik A. G. Aleksandra Gennadievna, Litovkin S. V. Sergey Valerievich, Seregin V. I., Rodionov P. V. Pavel Vadimovich, Kryuchkova S. О.
Summary:Title screen
The SiO[2]-B[2]O[3] and SiO[2]-P[2]O[5] films were synthesized by using film forming solutions having a P[2]O[5] content of up to 30% and B[2]O[3] up to 40%. Properties of the filmforming solutions and binary oxides were examined. The physical and chemical processes occurring in the solution during the heat treatment of films were examined. The conditions for producing films of different thicknesses were determined. The kinetic parameters were calculated.
Published: 2016
Subjects:
Online Access:http://dx.doi.org/10.1088/1757-899X/142/1/012066
http://earchive.tpu.ru/handle/11683/34750
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=650438
Description
Summary:Title screen
The SiO[2]-B[2]O[3] and SiO[2]-P[2]O[5] films were synthesized by using film forming solutions having a P[2]O[5] content of up to 30% and B[2]O[3] up to 40%. Properties of the filmforming solutions and binary oxides were examined. The physical and chemical processes occurring in the solution during the heat treatment of films were examined. The conditions for producing films of different thicknesses were determined. The kinetic parameters were calculated.
DOI:10.1088/1757-899X/142/1/012066