Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate

Deposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate

書目詳細資料
Parent link:	IOP Conference Series: Materials Science and Engineering Vol. 135 : Issues of Physics and Technology in Science, Industry and Medicine.— 2016.— [012055, 5 p.]
企業作者:	Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра теоретической и экспериментальной физики (ТиЭФ)
其他作者:	Zhidik Y. S., Troyan P. E., Baturina E. V., Korzhenko D. V. Dmitry Vladimirovich, Yuriev Yu. N. Yuri Nikolaevich
總結:	Title screen Detailed information on the deposition technology of the low-resistive ITO-films in oxygen-containing media by magnetron reactive sputtering from the In(90%)/Sn(10%) target on the cold substrate is given. Developed technology allows deposition ITO-films with sheet resistance transparency higher than 90%. Developed technology is notable for high reproducibility of results and is compatible with production technology of semiconductor devices of optoelectronics.
出版:	2016
主題:	электронный ресурс труды учёных ТПУ сопротивление пленки реактивное распыление магнетронное распыление мишени подложки осаждение полупроводниковые приборы оптоэлектроника
在線閱讀:	http://dx.doi.org/10.1088/1757-899X/135/1/012055 http://earchive.tpu.ru/handle/11683/34846
格式:	電子 Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=650344

因特網

http://dx.doi.org/10.1088/1757-899X/135/1/012055
http://earchive.tpu.ru/handle/11683/34846