Regimes of water droplet evaporation on copper substrates; Colloid Journal; Vol. 78, iss. 3

Regimes of water droplet evaporation on copper substrates; Colloid Journal; Vol. 78, iss. 3

Bibliographic Details
Parent link:Colloid Journal.— , 2000-
Vol. 78, iss. 3.— 2016.— [P. 335-339]
Corporate Author: Национальный исследовательский Томский политехнический университет Энергетический институт Кафедра теоретической и промышленной теплотехники
Other Authors: Kuznetsov G. V. Geny Vladimirovich, Feoktistov D. V. Dmitriy Vladimirovich, Orlova E. G. Evgeniya Georgievna, Batishcheva K. A. Kseniya Arturovna
Summary:Title screen
Distilled water droplet evaporation has been studied on copper substrate surfaces with different degrees of roughness. Data on variations in the contact diameter have been employed to distinguish between the regimes of distilled water droplet spreading over the copper surfaces that proceed after the viscous regime. For each isolated regime, the duration has been determined as a fraction of the total evaporation time and the main physical processes have been described. Variations in contact angles have been analyzed as depending on copper surface temperature. It has been established that, as the substrate temperature is elevated, wetting becomes better, while the adhesion work remains almost unchanged, thereby indicating the absence of chemical and structural transformations at the liquid–substrate interface.
Режим доступа: по договору с организацией-держателем ресурса
Language:English
Published: 2016
Subjects:
электронный ресурс
труды учёных ТПУ
вода
капля
испарение
Online Access:http://dx.doi.org/10.1134/S1061933X1603008X
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=650095

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