Modification of the cylindrical products outer surface influenced by radial beam of argon ions at automatic mode; Journal of Physics: Conference Series; Vol. 652 : Gas Discharge Plasmas and Their Applications (GDP 2015)
| Parent link: | Journal of Physics: Conference Series Vol. 652 : Gas Discharge Plasmas and Their Applications (GDP 2015).— 2015.— [012068, 5 p.] |
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| Autor Corporativo: | |
| Outros autores: | , , , , , , , , , |
| Summary: | Title screen Obtaining surface with high purity and good roughness is important for increasing the corrosion resistance and wear resistance of products working in corrosion-active environment. Installation ILUR-03 with the coaxial ion beam wide energy spectrum source for cleaning, polishing and surface doping of long cylindrical items has been developed. Upgraded installation ILUR-03 provides effective technological defects cleaning (abrasives after mechanical polishing, acid residues after chemical etching, adsorbed gases), surface polishing, film deposition by using magnetrons and surface doping by ion mixing method in one technological cycle. Режим доступа: по договору с организацией-держателем ресурса |
| Idioma: | inglés |
| Publicado: |
2015
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| Subjects: | |
| Acceso en liña: | http://dx.doi.org/10.1088/1742-6596/652/1/012068 http://earchive.tpu.ru/handle/11683/33828 |
| Formato: | Electrónico Capítulo de libro |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649349 |
| Summary: | Title screen Obtaining surface with high purity and good roughness is important for increasing the corrosion resistance and wear resistance of products working in corrosion-active environment. Installation ILUR-03 with the coaxial ion beam wide energy spectrum source for cleaning, polishing and surface doping of long cylindrical items has been developed. Upgraded installation ILUR-03 provides effective technological defects cleaning (abrasives after mechanical polishing, acid residues after chemical etching, adsorbed gases), surface polishing, film deposition by using magnetrons and surface doping by ion mixing method in one technological cycle. Режим доступа: по договору с организацией-держателем ресурса |
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| DOI: | 10.1088/1742-6596/652/1/012068 |