On the "Area Effect" in Metal-Dielectric-Metal Cathodes; Journal of Communications Technology and Electronics; Vol. 42, iss. 3
| Parent link: | Journal of Communications Technology and Electronics: Scientific Journal Vol. 42, iss. 3.— 1997.— [P. 346-347] |
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| Κύριος συγγραφέας: | |
| Άλλοι συγγραφείς: | , |
| Περίληψη: | Title screen A method of increasing the emissive part of the area of metal-dielectric-metal (MDM) cathodes by forming microscopic protuberances on one of the electrodes by the photolithographic technique is presented. The manufacturing technology for Al-SiO2-Al thin-film structure with microprotuberances of the size of ~1 µm is described. A mechanism for increasing the emission current is proposed. Режим доступа: по договору с организацией-держателем ресурса |
| Γλώσσα: | Αγγλικά |
| Έκδοση: |
1997
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| Θέματα: | |
| Διαθέσιμο Online: | https://www.scopus.com/record/display.uri?eid=2-s2.0-2742594986&origin=inward&txGid=0 |
| Μορφή: | Ηλεκτρονική πηγή Κεφάλαιο βιβλίου |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649261 |