High-current low-energy plasma electron sources

High-current low-energy plasma electron sources

Opis bibliograficzny
Parent link:Pulsed Power Plasma Science, 2001 IEEE.— 2001.— [P. 174-175]
1. autor: Schanin P. M.
Kolejni autorzy: Koval N. N. Nikolay Nikolaevich, Devyatkov V. N.
Streszczenie:Title screen
Summary form given only, as follows. The electron source with plasma cathode based on a low-pressure arc and glow discharge with hollow anode is considered in report. The plasma cathode allows to produce the gas-filled diode that provided more high perveance of diode and beam current then a vacuum diode. In gas-filled diode the electrons extracted from cathode into accelerating gap through a metallic mesh, that stabilizes emission boundary of the cathode plasma, ionize the gas producing anode plasma. The electrons are accelerated in layer which formed between the emission mesh electrode of plasma cathode and plasma anode. The formed beam by diode propagating through a drift tube, that is simultaneously anode of diode, is neutralized by ions plasma and is pinched by self magnetic-field so the current density to the tube end exceeds a few times that at the cathode. The beam current up to 1000 A and current density up to 100 A/cm/sup 2/ were obtained at accelerating voltage of 20 kV and pulse duration of 30 ?s. The self pinched electron beam propagates about 80% of current at distance 50 cm without break off or instabilities if the gas pressure exceeds 1·10/sup -2/ Pa.
Режим доступа: по договору с организацией-держателем ресурса
Język:angielski
Wydane: 2001
Hasła przedmiotowe:
электронный ресурс
труды учёных ТПУ
источники тока
низкая энергия
плазма
Dostęp online:http://dx.doi.org/10.1109/PPPS.2001.960746
Format: Elektroniczne Rozdział
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649175

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