High-current low-energy plasma electron sources; Pulsed Power Plasma Science, 2001 IEEE
| Parent link: | Pulsed Power Plasma Science, 2001 IEEE.— 2001.— [P. 174-175] |
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| 1. Verfasser: | |
| Weitere Verfasser: | , |
| Zusammenfassung: | Title screen Summary form given only, as follows. The electron source with plasma cathode based on a low-pressure arc and glow discharge with hollow anode is considered in report. The plasma cathode allows to produce the gas-filled diode that provided more high perveance of diode and beam current then a vacuum diode. In gas-filled diode the electrons extracted from cathode into accelerating gap through a metallic mesh, that stabilizes emission boundary of the cathode plasma, ionize the gas producing anode plasma. The electrons are accelerated in layer which formed between the emission mesh electrode of plasma cathode and plasma anode. The formed beam by diode propagating through a drift tube, that is simultaneously anode of diode, is neutralized by ions plasma and is pinched by self magnetic-field so the current density to the tube end exceeds a few times that at the cathode. The beam current up to 1000 A and current density up to 100 A/cm/sup 2/ were obtained at accelerating voltage of 20 kV and pulse duration of 30 ?s. The self pinched electron beam propagates about 80% of current at distance 50 cm without break off or instabilities if the gas pressure exceeds 1·10/sup -2/ Pa. Режим доступа: по договору с организацией-держателем ресурса |
| Sprache: | Englisch |
| Veröffentlicht: |
2001
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| Schlagworte: | |
| Online-Zugang: | http://dx.doi.org/10.1109/PPPS.2001.960746 |
| Format: | Elektronisch Buchkapitel |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649175 |
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| 200 | 1 | |a High-current low-energy plasma electron sources |f P. M. Schanin, N. N. Koval, V. N. Devyatkov | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 330 | |a Summary form given only, as follows. The electron source with plasma cathode based on a low-pressure arc and glow discharge with hollow anode is considered in report. The plasma cathode allows to produce the gas-filled diode that provided more high perveance of diode and beam current then a vacuum diode. In gas-filled diode the electrons extracted from cathode into accelerating gap through a metallic mesh, that stabilizes emission boundary of the cathode plasma, ionize the gas producing anode plasma. The electrons are accelerated in layer which formed between the emission mesh electrode of plasma cathode and plasma anode. The formed beam by diode propagating through a drift tube, that is simultaneously anode of diode, is neutralized by ions plasma and is pinched by self magnetic-field so the current density to the tube end exceeds a few times that at the cathode. The beam current up to 1000 A and current density up to 100 A/cm/sup 2/ were obtained at accelerating voltage of 20 kV and pulse duration of 30 ?s. The self pinched electron beam propagates about 80% of current at distance 50 cm without break off or instabilities if the gas pressure exceeds 1·10/sup -2/ Pa. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 463 | |t Pulsed Power Plasma Science, 2001 IEEE |v [P. 174-175] |o IEEE Conference Record - Abstracts |d 2001 | ||
| 610 | 1 | |a электронный ресурс | |
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| 610 | 1 | |a низкая энергия | |
| 610 | 1 | |a плазма | |
| 700 | 1 | |a Schanin |b P. M. | |
| 701 | 1 | |a Koval |b N. N. |c specialist in the field of electronics |c Professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1948- |g Nikolay Nikolaevich |3 (RuTPU)RU\TPU\pers\34748 | |
| 701 | 1 | |a Devyatkov |b V. N. | |
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