Plasma sources based on a low-pressure arc discharge; Laser and Particle Beams; Vol. 21, № 2

Մատենագիտական մանրամասներ
Parent link:Laser and Particle Beams
Vol. 21, № 2.— 2003.— [P. 249-254]
Այլ հեղինակներ: Akhmadeev Yu. H., Grigoriev S. V., Koval N. N. Nikolay Nikolaevich, Schanin P. M.
Ամփոփում:Title screen
This article presents two types of a hollow-cathode plasma source based on an arc discharge where the electrons emitted either by a hot filament or by a surface-discharge-based trigger system initiate a gas arc discharge. The sources produce gas plasmas of densities 1010–1012 cm-3 in large volumes of up to 0.5 m3 at a discharge current of 100–200 A and at a pressure of 10-1–10-2 Pa. Consideration is given to some peculiarities of the operation of the plasma sources with various working gases (Ar, N2, O2). The erosion rate of the cold hollow cathode in the designed plasma sources is shown to be 10 times lower than that found in an ordinary one. The sources are employed for plasma-assisted surface modification of solids.
Լեզու:անգլերեն
Հրապարակվել է: 2003
Խորագրեր:
Առցանց հասանելիություն:http://dx.doi.org/10.1017/S0263034603212131
Ձևաչափ: Էլեկտրոնային Գրքի գլուխ
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649166

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330 |a This article presents two types of a hollow-cathode plasma source based on an arc discharge where the electrons emitted either by a hot filament or by a surface-discharge-based trigger system initiate a gas arc discharge. The sources produce gas plasmas of densities 1010–1012 cm-3 in large volumes of up to 0.5 m3 at a discharge current of 100–200 A and at a pressure of 10-1–10-2 Pa. Consideration is given to some peculiarities of the operation of the plasma sources with various working gases (Ar, N2, O2). The erosion rate of the cold hollow cathode in the designed plasma sources is shown to be 10 times lower than that found in an ordinary one. The sources are employed for plasma-assisted surface modification of solids. 
461 |t Laser and Particle Beams 
463 |t Vol. 21, № 2  |v [P. 249-254]  |d 2003 
610 1 |a электронный ресурс 
610 1 |a труды учёных ТПУ 
610 1 |a дуговой разряд 
610 1 |a источник плазмы 
701 1 |a Akhmadeev  |b Yu. H. 
701 1 |a Grigoriev  |b S. V. 
701 1 |a Koval  |b N. N.  |c specialist in the field of electronics  |c Professor of Tomsk Polytechnic University, Doctor of technical sciences  |f 1948-  |g Nikolay Nikolaevich  |3 (RuTPU)RU\TPU\pers\34748  |9 18098 
701 1 |a Schanin  |b P. M. 
801 2 |a RU  |b 63413507  |c 20161020  |g RCR 
856 4 |u http://dx.doi.org/10.1017/S0263034603212131 
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