Generation of Gas Discharge Plasma by an Arc Source with a Cold Hollow Cathode
| Parent link: | Instruments and Experimental Techniques.— , 2000- Vol. 48, № 3.— 2005.— [P. 328-332] |
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| 第一著者: | |
| 団体著者: | |
| その他の著者: | , |
| 要約: | Title screen The results from a study of an arc plasma source with a cold hollow cathode are presented. The source generates plasma with a density of ~1010 cm-3 in a volume of ~0.2 m3 at discharge currents of up to 150 A, an arc discharge operating voltage of 30–40 V, and a low pressure of 0.1–1 Pa. The motion of the cathode spot in the crossed electric and magnetic fields inside the hollow cathode and the cathode’s special design make it possible to eliminate almost completely the penetration of the sputtered cathode material into the working vacuum chamber. Режим доступа: по договору с организацией-держателем ресурса |
| 言語: | 英語 |
| 出版事項: |
2005
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| 主題: | |
| オンライン･アクセス: | http://dx.doi.org/10.1007/s10786-005-0059-1 |
| フォーマット: | 電子媒体 図書の章 |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=649138 |
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| 200 | 1 | |a Generation of Gas Discharge Plasma by an Arc Source with a Cold Hollow Cathode |f P. M. Schanin, N. N. Koval, Yu. Kh. Akhmadeev | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: p. 332 (9 tit.)] | ||
| 330 | |a The results from a study of an arc plasma source with a cold hollow cathode are presented. The source generates plasma with a density of ~1010 cm-3 in a volume of ~0.2 m3 at discharge currents of up to 150 A, an arc discharge operating voltage of 30–40 V, and a low pressure of 0.1–1 Pa. The motion of the cathode spot in the crossed electric and magnetic fields inside the hollow cathode and the cathode’s special design make it possible to eliminate almost completely the penetration of the sputtered cathode material into the working vacuum chamber. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Instruments and Experimental Techniques |d 2000- | ||
| 463 | |t Vol. 48, № 3 |v [P. 328-332] |d 2005 | ||
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| 700 | 1 | |a Schanin |b P. M. | |
| 701 | 1 | |a Koval |b N. N. |c specialist in the field of electronics |c Professor of Tomsk Polytechnic University, Doctor of technical sciences |f 1948- |g Nikolay Nikolaevich |3 (RuTPU)RU\TPU\pers\34748 |9 18098 | |
| 701 | 1 | |a Akhmadeev |b Yu. Kh. | |
| 712 | 0 | 2 | |a Национальный исследовательский Томский политехнический университет (ТПУ) |c (2009- ) |3 (RuTPU)RU\TPU\col\15902 |
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