Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes; Russian Journal of General Chemistry; Vol. 85, iss. 5

Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes; Russian Journal of General Chemistry; Vol. 85, iss. 5

Chi tiết về thư mục
Parent link:	Russian Journal of General Chemistry.— , 2001- Vol. 85, iss. 5.— 2015.— [P. 1326-1338]
Tác giả khác:	Koval N. N. Nikolay Nikolaevich, Ivanov Yu. F. Yuriy Fedorovich, Lopatin I. V., Akhmadeev Y. H., Shugurov V. V., Krysina O. V., Denisov V. V.
Tóm tắt:	Title screen In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented. Режим доступа: по договору с организацией-держателем ресурса
Ngôn ngữ:	Tiếng Anh
Được phát hành:	2015
Những chủ đề:	электронный ресурс труды учёных ТПУ низкотемпературная плазма
Truy cập trực tuyến:	http://dx.doi.org/10.1134/S1070363215050485
Định dạng:	Điện tử Chương của sách
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648980

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