Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes

Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes

Bibliografiske detaljer
Parent link:	Russian Journal of General Chemistry.— , 2001- Vol. 85, iss. 5.— 2015.— [P. 1326-1338]
Andre forfattere:	Koval N. N. Nikolay Nikolaevich, Ivanov Yu. F. Yuriy Fedorovich, Lopatin I. V., Akhmadeev Y. H., Shugurov V. V., Krysina O. V., Denisov V. V.
Summary:	Title screen In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented. Режим доступа: по договору с организацией-держателем ресурса
Udgivet:	2015
Fag:	электронный ресурс труды учёных ТПУ низкотемпературная плазма
Online adgang:	http://dx.doi.org/10.1134/S1070363215050485
Format:	Electronisk Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648980

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