Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes; Russian Journal of General Chemistry; Vol. 85, iss. 5

Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes; Russian Journal of General Chemistry; Vol. 85, iss. 5

Bibliographic Details
Parent link:	Russian Journal of General Chemistry.— , 2001- Vol. 85, iss. 5.— 2015.— [P. 1326-1338]
Other Authors:	Koval N. N. Nikolay Nikolaevich, Ivanov Yu. F. Yuriy Fedorovich, Lopatin I. V., Akhmadeev Y. H., Shugurov V. V., Krysina O. V., Denisov V. V.
Summary:	Title screen In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented. Режим доступа: по договору с организацией-держателем ресурса
Language:	English
Published:	2015
Subjects:	электронный ресурс труды учёных ТПУ низкотемпературная плазма
Online Access:	http://dx.doi.org/10.1134/S1070363215050485
Format:	Electronic Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648980

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