Generation of low-temperature gas discharge plasma in large vacuum volumes for plasma chemical processes; Russian Journal of General Chemistry; Vol. 85, iss. 5
| Parent link: | Russian Journal of General Chemistry.— , 2001- Vol. 85, iss. 5.— 2015.— [P. 1326-1338] |
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| Outros Autores: | , , , , , , |
| Resumo: | Title screen In the paper the principles of generation of low temperature capacitively coupled in a vacuum chamber of a large size with the use of original low-pressure arc discharges are considered. The designs of plasma sources and their main parameters are described. Examples of effective use of the generated plasma in plasma chemical modification of the surfaces of materials and products are presented. Режим доступа: по договору с организацией-держателем ресурса |
| Idioma: | inglês |
| Publicado em: |
2015
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| Assuntos: | |
| Acesso em linha: | http://dx.doi.org/10.1134/S1070363215050485 |
| Formato: | MixedMaterials Recurso Electrónico Capítulo de Livro |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648980 |