Aluminum films deposition by magnetron sputtering systems:Influence of target state and pulsing unit

Aluminum films deposition by magnetron sputtering systems:Influence of target state and pulsing unit

書目詳細資料
Parent link:	Optoelectronics, Photonics, Engineering and Nanostructures, OPEN 2016: Book of Abstracts 3rd International School and Conference, St Petersburg, Russia, March 28-30, 2016. [P. 571-572].— , 2016
Corporate Authors:	Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра экспериментальной физики (ЭФ), Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра общей физики (ОФ)
其他作者:	Sidelev D. V. Dmitry Vladimirovich, Yuryeva A. V. Alena Victorovna, Krivobokov V. P. Valery Pavlovich, Shabunin A. S. Artem Sergeevich, Syrtanov M. S. Maksim Sergeevich, Koyshybaeva Zh. K. Zhanymgul Koyshybaykyzy
總結:	Title screen This article reports on technological possibilities of magnetron sputtering systemswith solid-state and liquid targets to deposition of Al films and its structure. There is shown acomparing of deposition rate of magnetron sputtering systems with direct current (DC), midfrequency(MF) and high power pulsed (HiPIMS) supplies. The dependence of plasmacomposition, films stricture and sputtering technique parameters is obtained.
出版:	2016
主題:	электронный ресурс труды учёных ТПУ
在線閱讀:	http://spbopen.spbau.com/PDF/Book_of_Abstracts_SPBOPEN_2016.pdf#page=571
格式:	電子 Book Chapter
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648815

因特網

http://spbopen.spbau.com/PDF/Book_of_Abstracts_SPBOPEN_2016.pdf#page=571