Modification of copper surface by runaway electronspreionized diffuse discharges at atmospheric pressure; Laser and Particle Beams; Vol. 34, iss. 2

Detalles Bibliográficos
Parent link:Laser and Particle Beams
Vol. 34, iss. 2.— 2016.— [P. 202-209]
Corporate Authors: Национальный исследовательский Томский политехнический университет Институт природных ресурсов Кафедра геологии и разработки нефтяных месторождений, Национальный исследовательский Томский политехнический университет Институт неразрушающего контроля Кафедра промышленной и медицинской электроники
Outros autores: Zhang Cheng, Erofeev M. V. Mikhail Vladimirovich, Fang Zhi, Shulepov M. A., Zhou Zhongsheng, Shao Tao, Tarasenko V. F. Victor Fedotovich
Summary:Title screen
Runaway electrons preionized diffuse discharge (REP DD) could generate volume non-thermal plasmas at atmosphericpressure, thus is widely used for surface modification. In this paper, two pulsed generators are used to produce REPDD for modifying copper (Cu) foil in atmospheric air. One generator produces repetitive pulses with a peak voltage of40 kV and a rise time of 150 ns. The other generator produces single pulse with a peak voltage of 280 kV and a risetime of 0.5 ns. After the treatment, the modification results for including the macro topography, chemical compositionand microhardness in different depths of the Cu surface are analyzed. In order to estimate the modification results indifferent areas of the Cu foil, several points from the center to the edge of the Cu sample are selected. It could beobserved that the maximal modification effect usually appears in the area where the density of the diffuse dischargeplasma is highest. The experimental results show REP DD treatment could significantly decrease the water contactangle and increase surface energy of the Cu foil. Meanwhile, it could decrease the carbon concentration and increaseoxygen concentration in the near-surface layer of the Cu sample, and enhance the microhardness in different depths ofthe Cu foil.
Режим доступа: по договору с организацией-держателем ресурса
Idioma:inglés
Publicado: 2016
Subjects:
Acceso en liña:http://dx.doi.org/10.1017/S0263034616000033
Formato: Electrónico Capítulo de libro
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648753

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200 1 |a Modification of copper surface by runaway electronspreionized diffuse discharges at atmospheric pressure  |f Zhang Cheng [et al.] 
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300 |a Title screen 
320 |a [References: 26 tit.] 
330 |a Runaway electrons preionized diffuse discharge (REP DD) could generate volume non-thermal plasmas at atmosphericpressure, thus is widely used for surface modification. In this paper, two pulsed generators are used to produce REPDD for modifying copper (Cu) foil in atmospheric air. One generator produces repetitive pulses with a peak voltage of40 kV and a rise time of 150 ns. The other generator produces single pulse with a peak voltage of 280 kV and a risetime of 0.5 ns. After the treatment, the modification results for including the macro topography, chemical compositionand microhardness in different depths of the Cu surface are analyzed. In order to estimate the modification results indifferent areas of the Cu foil, several points from the center to the edge of the Cu sample are selected. It could beobserved that the maximal modification effect usually appears in the area where the density of the diffuse dischargeplasma is highest. The experimental results show REP DD treatment could significantly decrease the water contactangle and increase surface energy of the Cu foil. Meanwhile, it could decrease the carbon concentration and increaseoxygen concentration in the near-surface layer of the Cu sample, and enhance the microhardness in different depths ofthe Cu foil. 
333 |a Режим доступа: по договору с организацией-держателем ресурса 
461 |t Laser and Particle Beams 
463 |t Vol. 34, iss. 2  |v [P. 202-209]  |d 2016 
610 1 |a электронный ресурс 
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610 1 |a плазменная обработка 
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701 0 |a Zhang Cheng 
701 1 |a Erofeev  |b M. V.  |c specialist in the field of oil and gas business  |c Associate Professor of Tomsk Polytechnic University, Candidate of physical and mathematical sciences  |f 1975-  |g Mikhail Vladimirovich  |3 (RuTPU)RU\TPU\pers\34250  |9 17781 
701 0 |a Fang Zhi 
701 1 |a Shulepov  |b M. A. 
701 0 |a Zhou Zhongsheng 
701 0 |a Shao Tao 
701 1 |a Tarasenko  |b V. F.  |c physicist  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |f 1946-  |g Victor Fedotovich  |3 (RuTPU)RU\TPU\pers\32090  |9 16129 
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712 0 2 |a Национальный исследовательский Томский политехнический университет  |b Институт неразрушающего контроля  |b Кафедра промышленной и медицинской электроники  |3 (RuTPU)RU\TPU\col\18719  |9 27169 
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