Nitriding of technical-purity titanium in hollow-cathode glow discharge

Nitriding of technical-purity titanium in hollow-cathode glow discharge

Bibliographic Details
Parent link:Technical Physics Letters.— , 1975-
Vol. 31, № 7.— 2005.— [P. 548-550]
Other Authors: Akhmadeev Yu. Kh., Goncharenko I. M., Ivanov Yu. F. Yuriy Fedorovich, Koval N. N. Nikolay Nikolaevich, Schanin P. M.
Summary:Title screen
The process of nitriding at low pressures and temperatures (=550°C) in hollow-cathode glow discharge plasma was studied for technical-purity titanium of the VT1-0 commercial grade. The diffusion saturation of titanium with nitrogen in plasma with a concentration of n = 1010–1011 cm-3 takes place at an ion current density on the cathode within 1.6–4.0 mA/cm2. It is established that a key role in the process of metal saturation is played by atomic nitrogen. The experiments revealed the formation of a layer of gradient structure with a high microhardness (~14 GPa) on the surface of nitrided titanium.
Режим доступа: по договору с организацией-держателем ресурса
Published: 2005
Subjects:
электронный ресурс
труды учёных ТПУ
Online Access:http://dx.doi.org/10.1134/1.2001050
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648648

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