Nitriding of technical-purity titanium in hollow-cathode glow discharge; Technical Physics Letters; Vol. 31, № 7
| Parent link: | Technical Physics Letters.— , 1975- Vol. 31, № 7.— 2005.— [P. 548-550] |
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| Weitere Verfasser: | , , , , |
| Zusammenfassung: | Title screen The process of nitriding at low pressures and temperatures (=550°C) in hollow-cathode glow discharge plasma was studied for technical-purity titanium of the VT1-0 commercial grade. The diffusion saturation of titanium with nitrogen in plasma with a concentration of n = 1010–1011 cm-3 takes place at an ion current density on the cathode within 1.6–4.0 mA/cm2. It is established that a key role in the process of metal saturation is played by atomic nitrogen. The experiments revealed the formation of a layer of gradient structure with a high microhardness (~14 GPa) on the surface of nitrided titanium. Режим доступа: по договору с организацией-держателем ресурса |
| Sprache: | Englisch |
| Veröffentlicht: |
2005
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| Schlagworte: | |
| Online-Zugang: | http://dx.doi.org/10.1134/1.2001050 |
| Format: | MixedMaterials Elektronisch Buchkapitel |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648648 |
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| 200 | 1 | |a Nitriding of technical-purity titanium in hollow-cathode glow discharge |f Yu. Kh. Akhmadeev [et al.] | |
| 203 | |a Text |c electronic | ||
| 300 | |a Title screen | ||
| 320 | |a [References: p. 550 (9 tit.)] | ||
| 330 | |a The process of nitriding at low pressures and temperatures (=550°C) in hollow-cathode glow discharge plasma was studied for technical-purity titanium of the VT1-0 commercial grade. The diffusion saturation of titanium with nitrogen in plasma with a concentration of n = 1010–1011 cm-3 takes place at an ion current density on the cathode within 1.6–4.0 mA/cm2. It is established that a key role in the process of metal saturation is played by atomic nitrogen. The experiments revealed the formation of a layer of gradient structure with a high microhardness (~14 GPa) on the surface of nitrided titanium. | ||
| 333 | |a Режим доступа: по договору с организацией-держателем ресурса | ||
| 461 | |t Technical Physics Letters |d 1975- | ||
| 463 | |t Vol. 31, № 7 |v [P. 548-550] |d 2005 | ||
| 610 | 1 | |a электронный ресурс | |
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| 701 | 1 | |a Akhmadeev |b Yu. Kh. | |
| 701 | 1 | |a Goncharenko |b I. M. | |
| 701 | 1 | |a Ivanov |b Yu. F. |c physicist |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences |f 1955- |g Yuriy Fedorovich |3 (RuTPU)RU\TPU\pers\33559 |9 17226 | |
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