Nitriding of technical-purity titanium in hollow-cathode glow discharge
| Parent link: | Technical Physics Letters.— , 1975- Vol. 31, № 7.— 2005.— [P. 548-550] |
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| Weitere Verfasser: | , , , , |
| Zusammenfassung: | Title screen The process of nitriding at low pressures and temperatures (=550°C) in hollow-cathode glow discharge plasma was studied for technical-purity titanium of the VT1-0 commercial grade. The diffusion saturation of titanium with nitrogen in plasma with a concentration of n = 1010–1011 cm-3 takes place at an ion current density on the cathode within 1.6–4.0 mA/cm2. It is established that a key role in the process of metal saturation is played by atomic nitrogen. The experiments revealed the formation of a layer of gradient structure with a high microhardness (~14 GPa) on the surface of nitrided titanium. Режим доступа: по договору с организацией-держателем ресурса |
| Veröffentlicht: |
2005
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| Schlagworte: | |
| Online-Zugang: | http://dx.doi.org/10.1134/1.2001050 |
| Format: | Elektronisch Buchkapitel |
| KOHA link: | https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648648 |
| Zusammenfassung: | Title screen The process of nitriding at low pressures and temperatures (=550°C) in hollow-cathode glow discharge plasma was studied for technical-purity titanium of the VT1-0 commercial grade. The diffusion saturation of titanium with nitrogen in plasma with a concentration of n = 1010–1011 cm-3 takes place at an ion current density on the cathode within 1.6–4.0 mA/cm2. It is established that a key role in the process of metal saturation is played by atomic nitrogen. The experiments revealed the formation of a layer of gradient structure with a high microhardness (~14 GPa) on the surface of nitrided titanium. Режим доступа: по договору с организацией-держателем ресурса |
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| DOI: | 10.1134/1.2001050 |