Laser generation of XeCl exciplex molecules in a longitudinal repetitively pulsed discharge in a Xe – CsCl mixture; Quantum Electronics; Vol. 45, № 12

Laser generation of XeCl exciplex molecules in a longitudinal repetitively pulsed discharge in a Xe – CsCl mixture

Bibliographic Details
Parent link:Quantum Electronics.— , 1971-
Vol. 45, № 12.— 2015.— [P. 1105-1110]
Main Author: Boychenko A. M. Aleksandr Mikhaylovich
Corporate Author: Национальный исследовательский Томский политехнический университет Институт неразрушающего контроля Кафедра промышленной и медицинской электроники
Other Authors: Klenovskii (Klenovsky) M. S. Miron Stanislavovich
Summary:Title screen
By using the previously developed kinetic model, we have carried out simulations to study the possibility of laser generation of XeCl exciplex molecules in the working medium based on a mixture of Xe with CsCl vapours, excited by a longitudinal repetitively pulsed discharge. The formation mechanism of exciplex molecules in this mixture is fundamentally different from the formation mechanisms in the traditional mixtures of exciplex lasers. The conditions that make the laser generation possible are discussed. For these conditions, with allowance for available specific experimental conditions of the repetitively pulsed discharge excitation, we have obtained the calculated dependences of the power and efficiency of generation on the reflectivity of mirrors in a laser cavity.
Режим доступа: по договору с организацией-держателем ресурса
Language:English
Published: 2015
Subjects:
электронный ресурс
труды учёных ТПУ
Online Access:http://dx.doi.org/10.1070/QE2015v045n12ABEH015859
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648372
Description
Summary:Title screen
By using the previously developed kinetic model, we have carried out simulations to study the possibility of laser generation of XeCl exciplex molecules in the working medium based on a mixture of Xe with CsCl vapours, excited by a longitudinal repetitively pulsed discharge. The formation mechanism of exciplex molecules in this mixture is fundamentally different from the formation mechanisms in the traditional mixtures of exciplex lasers. The conditions that make the laser generation possible are discussed. For these conditions, with allowance for available specific experimental conditions of the repetitively pulsed discharge excitation, we have obtained the calculated dependences of the power and efficiency of generation on the reflectivity of mirrors in a laser cavity.
Режим доступа: по договору с организацией-держателем ресурса
DOI:10.1070/QE2015v045n12ABEH015859

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