Deposition of ultrahard Ti–Si–N coatings by pulsed high-current reactive magnetron sputtering; Technical Physics; Vol. 61, iss. 2

Deposition of ultrahard Ti–Si–N coatings by pulsed high-current reactive magnetron sputtering; Technical Physics; Vol. 61, iss. 2

গ্রন্থ-পঞ্জীর বিবরন
Parent link:	Technical Physics: Scientific Journal.— , 1931- Vol. 61, iss. 2.— 2016.— [P. 215-220]
সংস্থা লেখক:	Национальный исследовательский Томский политехнический университет Физико-технический институт Кафедра теоретической и экспериментальной физики
অন্যান্য লেখক:	Oskomov K. V. Konstantin Vladimirovich, Zakharov A. N. Aleksandr Nikolaevich, Rabotkin S. V. Sergey Viktorovich, Soloviev (Solovyev) A. A. Andrey Aleksandrovich
সংক্ষিপ্ত:	Title screen We report on the results of investigation of properties of ultrahard Ti–Si–N coatings deposited by pulsed high-current magnetron reactive sputtering (discharge pulse voltage is 300–900 V, discharge pulse current is up to 200 A, pulse duration is 10–100 ?s, and pulse repetition rate is 20–2000 Hz). It is shown that for a short sputtering pulse (25 ?s) and a high discharge current (160 A), the films exhibit high hardness (66 GPa), wear resistance, better adhesion, and a lower sliding friction coefficient. The reason is an enhancement of ion bombardment of the growing coating due to higher plasma density in the substrate region (1013 cm–3) and a manifold increase in the degree of ionization of the plasma with increasing peak discharge current (mainly due to the material being sputtered). Режим доступа: по договору с организацией-держателем ресурса
ভাষা:	ইংরেজি
প্রকাশিত:	2016
মালা:	Physical Science Of Materials
বিষয়গুলি:	электронный ресурс труды учёных ТПУ
অনলাইন ব্যবহার করুন:	http://dx.doi.org/10.1134/S1063784216020171
বিন্যাস:	বৈদ্যুতিক গ্রন্থের অধ্যায়
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648363

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