Deposition of ultrahard Ti–Si–N coatings by pulsed high-current reactive magnetron sputtering; Technical Physics; Vol. 61, iss. 2

Deposition of ultrahard Ti–Si–N coatings by pulsed high-current reactive magnetron sputtering; Technical Physics; Vol. 61, iss. 2

書誌詳細
Parent link:Technical Physics: Scientific Journal.— , 1931-
Vol. 61, iss. 2.— 2016.— [P. 215-220]
団体著者: Национальный исследовательский Томский политехнический университет Физико-технический институт Кафедра теоретической и экспериментальной физики
その他の著者: Oskomov K. V. Konstantin Vladimirovich, Zakharov A. N. Aleksandr Nikolaevich, Rabotkin S. V. Sergey Viktorovich, Soloviev (Solovyev) A. A. Andrey Aleksandrovich
要約:Title screen
We report on the results of investigation of properties of ultrahard Ti–Si–N coatings deposited by pulsed high-current magnetron reactive sputtering (discharge pulse voltage is 300–900 V, discharge pulse current is up to 200 A, pulse duration is 10–100 ?s, and pulse repetition rate is 20–2000 Hz). It is shown that for a short sputtering pulse (25 ?s) and a high discharge current (160 A), the films exhibit high hardness (66 GPa), wear resistance, better adhesion, and a lower sliding friction coefficient. The reason is an enhancement of ion bombardment of the growing coating due to higher plasma density in the substrate region (1013 cm–3) and a manifold increase in the degree of ionization of the plasma with increasing peak discharge current (mainly due to the material being sputtered).
Режим доступа: по договору с организацией-держателем ресурса
言語:英語
出版事項: 2016
シリーズ:Physical Science Of Materials
主題:
электронный ресурс
труды учёных ТПУ
オンライン･アクセス:http://dx.doi.org/10.1134/S1063784216020171
フォーマット: 電子媒体 図書の章
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648363

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