Superhard nanocrystalline Ti-Cu-N coatings deposited by vacuum arc evaporation of a sintered cathode

書誌詳細
Parent link:	Surface and Coatings Technology.— , 1986- Vol. 207.— 2012.— [P. 430-434]
団体著者:	Национальный исследовательский Томский политехнический университет (ТПУ)
その他の著者:	Ivanov Yu. F. Yuriy Fedorovich, Koval N. N. Nikolay Nikolaevich, Krysina O. V., Baumbach T., Doyle S., Slobodsky T., Timchenko N. A. Nikolay Alekseevich, Galimov R. M.
要約:	Title screen Experimental data are presented on the structure and properties of hardening nanocrystalline copper-addedtitanium nitride coatings produced by plasma-assisted vacuum arc evaporation of sintered cathodes. A modelof the nanostructurization of this type of coating is proposed. According to the model, the nanocrystallizationin these materials is due to the added atoms, which form an amorphous sheath around a grain that restrictsthe grain growth. Режим доступа: по договору с организацией-держателем ресурса
出版事項:	2012
主題:	электронный ресурс труды учёных ТПУ nanocrystalline structure X-ray diffraction дифракция рентгеновского излучения Ti–Cu–N coating Ti-Cu-Ni покрытия
オンライン･アクセス:	http://dx.doi.org/10.1016/j.surfcoat.2012.07.037
フォーマット:	電子媒体図書の章
KOHA link:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=648146

その他の書誌記述
要約:	Title screen Experimental data are presented on the structure and properties of hardening nanocrystalline copper-addedtitanium nitride coatings produced by plasma-assisted vacuum arc evaporation of sintered cathodes. A modelof the nanostructurization of this type of coating is proposed. According to the model, the nanocrystallizationin these materials is due to the added atoms, which form an amorphous sheath around a grain that restrictsthe grain growth. Режим доступа: по договору с организацией-держателем ресурса
DOI:	10.1016/j.surfcoat.2012.07.037

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