The change in optical and electrical characteristics of tin oxide films under the action of argon ion beam; Journal of Physics: Conference Series; Vol. 669 : Low temperature Plasma in the Processes of Functional Coating Preparation

The change in optical and electrical characteristics of tin oxide films under the action of argon ion beam

Bibliographic Details
Parent link:Journal of Physics: Conference Series
Vol. 669 : Low temperature Plasma in the Processes of Functional Coating Preparation.— 2016.— [012059, 4 p.]
Main Author: Asainov O. Kh. Oleg Khaydarovich
Corporate Author: Национальный исследовательский Томский политехнический университет
Other Authors: Umnov S. P. Sergey Pavlovich, Temenkov V. S. Vladimir Sergeevich
Summary:Title screen
Thin films of tin oxide (TO) were deposited on the glass substrates at room temperature using reactive magnetron sputtering at various oxygen partial pressures. After the deposition the filmswere irradiated with argon ions beam. The change of the optical and electrical properties of the films depending on the irradiation time was studied. Films optical properties in the range of 300-1100 nm were investigated by photometry as well as their structural properties were studied using X-ray diffraction. Diffractometric research showed that the films, deposited on a substrate, have a crystal structure, and after argon ions irradiation they become quasi-crystalline (amorphous). It was found that the transmission increases proportionally with the irradiation time, but the surface resistance -disproportionally.
Language:English
Published: 2016
Subjects:
электронный ресурс
труды учёных ТПУ
Online Access:http://dx.doi.org/10.1088/1742-6596/669/1/012059
Format: Electronic Book Chapter
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=647375

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