The Influence of High-Power Ion Beams and High-Intensity Short-Pulse Implantation of Ions on the Properties of Ceramic Silicon Carbide

Dades bibliogràfiques
Parent link:IOP Conference Series: Materials Science and Engineering
Vol. 110 : Radiation-Thermal Effects and Processes in Inorganic Materials (RTEP2015).— 2016.— [012006, 5 p.]
Autor corporatiu: Национальный исследовательский Томский политехнический университет (ТПУ) Энергетический институт (ЭНИН) Кафедра электроснабжения промышленных предприятий (ЭПП), Национальный исследовательский Томский политехнический университет (ТПУ) Институт физики высоких технологий (ИФВТ) Лаборатория № 1
Altres autors: Kabyshev A. V. Alexander Vasilievich, Konusov F. V. Fedor Valerievich, Pavlov S. K. Sergey Konstantinovich, Remnev G. E. Gennady Efimovich
Sumari:Title screen
The paper is focused on the study of the structural, electrical and optical characteristics of the ceramic silicon carbide before and after irradiation in the regimes of the high-power ion beams (HPIB) and high-intensity short-pulse implantation (HISPI) of carbon ions. The dominant mechanism of transport of charge carriers, their type and the energy spectrum of localized states (LS) of defects determining the properties of SiC were established. Electrical and optical characteristics of ceramic before and after irradiation are determined by the biographical and radiation defects whose band gap (BG) energy levels have a continuous energetic distribution. A dominant p-type activation component of conduction with participation of shallow acceptor levels 0.05-0.16 eV is complemented by hopping mechanism of conduction involving the defects LS with a density of 1.2T0{17}-2.4T0{18} eV{-}Am{-3} distributed near the Fermi level.The effect of radiation defects with deep levels in the BG on properties change dominates after HISPI. A new material with the changed electronic structure and properties is formed in the near surface layer of SiC after the impact of the HPIB.
Режим доступа: по договору с организацией-держателем ресурса
Idioma:anglès
Publicat: 2016
Matèries:
Accés en línia:http://dx.doi.org/10.1088/1757-899X/110/1/012006
http://earchive.tpu.ru/handle/11683/18073
Format: Electrònic Capítol de llibre
KOHA link:https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=646991

MARC

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200 1 |a The Influence of High-Power Ion Beams and High-Intensity Short-Pulse Implantation of Ions on the Properties of Ceramic Silicon Carbide  |f A. V. Kabyshev [et al.] 
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330 |a The paper is focused on the study of the structural, electrical and optical characteristics of the ceramic silicon carbide before and after irradiation in the regimes of the high-power ion beams (HPIB) and high-intensity short-pulse implantation (HISPI) of carbon ions. The dominant mechanism of transport of charge carriers, their type and the energy spectrum of localized states (LS) of defects determining the properties of SiC were established. Electrical and optical characteristics of ceramic before and after irradiation are determined by the biographical and radiation defects whose band gap (BG) energy levels have a continuous energetic distribution. A dominant p-type activation component of conduction with participation of shallow acceptor levels 0.05-0.16 eV is complemented by hopping mechanism of conduction involving the defects LS with a density of 1.2T0{17}-2.4T0{18} eV{-}Am{-3} distributed near the Fermi level.The effect of radiation defects with deep levels in the BG on properties change dominates after HISPI. A new material with the changed electronic structure and properties is formed in the near surface layer of SiC after the impact of the HPIB. 
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701 1 |a Kabyshev  |b A. V.  |c specialist in the field of electric power engineering  |c Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences  |f 1958-  |g Alexander Vasilievich  |3 (RuTPU)RU\TPU\pers\32572 
701 1 |a Konusov  |b F. V.  |c physicist  |c Lead Engineer of Tomsk Polytechnic University, Candidate of physical and mathematical sciences  |f 1958-  |g Fedor Valerievich  |y Tomsk  |3 (RuTPU)RU\TPU\pers\32570  |9 16491 
701 1 |a Pavlov  |b S. K.  |c physicist  |c Engineer of Tomsk Polytechnic University  |f 1990-  |g Sergey Konstantinovich  |3 (RuTPU)RU\TPU\pers\32875 
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