Structural Changes of Titanium Dioxide Thin Films Deposited by Reactive Magnetron Sputtering through Nitrogen Incorporation; Key Engineering Materials; Vol. 683 : Multifunctional Materials: Development and Application

Structural Changes of Titanium Dioxide Thin Films Deposited by Reactive Magnetron Sputtering through Nitrogen Incorporation; Key Engineering Materials; Vol. 683 : Multifunctional Materials: Development and Application

Библиографические подробности
Источник:	Key Engineering Materials: Scientific Journal Vol. 683 : Multifunctional Materials: Development and Application.— 2016.— [P. 383-388]
Главный автор:	Pustovalova A. A. Alla Aleksandrovna
Автор-организация:	Национальный исследовательский Томский политехнический университет (ТПУ) Физико-технический институт (ФТИ) Кафедра экспериментальной физики (ЭФ)
Другие авторы:	Ivanova N. M. Nina Mikhailovna
Примечания:	Title screen This paper presents the results of the studies of the structure and chemical composition of nitrogen-doped titanium dioxide thin films obtained by reactive magnetron sputtering deposition. The XRD data show the changes of the structure and phase composition of titanium dioxide thin films due to the nitrogen doping. The change of the films structure increases with the growth of the nitrogen content. The reduction of crystallites size takes place at the increase of the nitrogen concentration. Chemical bonds present in the films were examined by FTIR spectroscopy. Режим доступа: по договору с организацией-держателем ресурса
Язык:	английский
Опубликовано:	2016
Серии:	Physicochemical Properties of Materials and Current Processing Technologies
Предметы:	электронный ресурс труды учёных ТПУ магнетронное распыление азот фазовые переходы тонкие пленки диоксид титана дифракция рентгеновские лучи инкорпорация
Online-ссылка:	http://dx.doi.org/10.4028/www.scientific.net/KEM.683.383
Формат:	Электронный ресурс Статья
Запись в KOHA:	https://koha.lib.tpu.ru/cgi-bin/koha/opac-detail.pl?biblionumber=646637

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